Graphene device and method of manufacturing the same
    11.
    发明公开
    Graphene device and method of manufacturing the same 审中-公开
    Graphenvorrichtung und Verfahren zu ihrer Herstellung

    公开(公告)号:EP2620982A2

    公开(公告)日:2013-07-31

    申请号:EP13150824.4

    申请日:2013-01-10

    摘要: A method of manufacturing a graphene device may include forming a device portion including a graphene layer (GP1) on the first substrate (SUB1); attaching a second substrate (SUB2) on the device portion of the first substrate; and removing the first substrate. The removing of the first substrate may include etching a sacrificial layer between the first substrate and the graphene layer. After removing the first substrate, a third substrate may be attached on the device portion. After attaching the third substrate, the second substrate may be removed.

    摘要翻译: 制造石墨烯器件的方法可以包括在第一衬底(SUB1)上形成包括石墨烯层(GP1)的器件部分; 将第二基板(SUB2)附接在所述第一基板的所述装置部分上; 并移除第一衬底。 去除第一衬底可以包括在第一衬底和石墨烯层之间蚀刻牺牲层。 在移除第一衬底之后,可以在器件部分上附接第三衬底。 在附接第三基板之后,可以移除第二基板。