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    UP -CONVERSION OF ELECTROMAGNETIC RADIATION WITHIN A WAVELENGTH RANGE
    12.
    发明公开
    UP -CONVERSION OF ELECTROMAGNETIC RADIATION WITHIN A WAVELENGTH RANGE 审中-公开
    UP转换成无线电波中的波长范围

    公开(公告)号：EP2567286A1

    公开(公告)日：2013-03-13

    申请号：EP11719460.5

    申请日：2011-05-03

    申请人： Danmarks Tekniske Universitet

    发明人： DAM, Jeppe Seidelin

    IPC分类号： G02F1/35

    CPC分类号： G02F1/3534 ,  G02B5/1876 ,  G02F2001/3503 ,  G02F2203/04

    摘要： Prior art techniques for converting the wavelength of electromagnetic radiation by non-linear interactions such as sum frequency generation SFG produces blurred images when applied to polychromatic images. The invention provides an improved arrangement (15) for up-converting incoming electromagnetic radiation with dissimilar first wavelengths (lambda,) distributed in a first wavelength interval (Deltalambda,) into up-converted electromagnetic radiation comprising corresponding dissimilar up-converted wavelengths (lambda3), smaller than the first wavelengths (Delta1). The arrangement applies a nonlinear crystal (5) and a laser (16) for providing a laser beam (10) of second wavelength, different from the first wavelengths (lambda1) inside the nonlinear crystal, and a Fresnel zone plate (17) for focusing or converging the incoming radiation inside the nonlinear crystal in spatial overlap with the laser beam. The up-converted radiation is produced inside the non-linear crystal by sum frequency generation between the incoming radiation and the laser beam. The arrangement (15) can comprise an image forming lens arrangement (20) for forming an object image (2), a second zone plate (18) for forming an up-converted image (3) and an image sensor (19) on which the up-converted image (3) is formed.

    MICRO-OPTICAL SYSTEM FOR FORMING VISUAL IMAGES
    13.
    发明公开
    MICRO-OPTICAL SYSTEM FOR FORMING VISUAL IMAGES 审中-公开
    MIKROOPTISCHES系统ZUR FORMUNG VISUELLER BILDER

    公开(公告)号：EP2546070A1

    公开(公告)日：2013-01-16

    申请号：EP11752882.8

    申请日：2011-02-22

    申请人： Computer Holography Center

    发明人： GONCHARSKIY, Anton Alexandrovich ,  GONCHARSKIY, Alexander Vladimirovich ,  DURLEVICH, Svyatoslav Radomirovich

    IPC分类号： B42D15/10 ,  B44F1/12 ,  B81B7/04 ,  G02B3/08

    CPC分类号： G02B3/08 ,  B42D25/324 ,  B42D25/355 ,  B42D25/425 ,  G02B5/1876

    摘要： The micro-optical system of the synthesis of visual images claimed as the invention is primarily a device used to certify the authenticity of products and can be used efficiently to protect bank notes, securities, documents, plastic cards, bank charge cards, documentary, identification, and control stamps, and various consumer goods against counterfeit.
    The micro-optical system in accordance with the claimed invention consists of a base with a single layer of flat optical elements, which have the form of flat off-axis Fresnel lenses with a paraboloid phase function or flat off-axis Fresnel lenses with a saddle-shaped phase function made in the form of microrelief and effecting, when the microoptical system is illuminated, the synthesis of images consisting of separate points exhibiting the visual effect of the motion of synthesized images when the base is tilted with respect to the observer.
    The technical result consists in improved reliability of the visual control of the products protected using the claimed system due to the creation of easy-to-control effect of image motion combined with reduced thickness of the claimed system.
    The invention can be implemented using the already available standard equipment.

    摘要翻译： 作为本发明的视觉图像的合成的微光学系统主要是用于证明产品的真实性的装置，并且可以有效地用于保护纸币，证券，文件，塑料卡，银行卡，纪录片，识别 ，并控制邮票和各种消费品打击假冒。 根据要求保护的发明的微光学系统由具有单层平面光学元件的基底组成，其具有抛物面相位函数的平面离轴菲涅耳透镜的形式或具有鞍形的平坦离轴菲涅耳透镜 形状相位函数以微观形式形成，并且当微光学系统被照亮时，合成图像，当基底相对于观察者倾斜时，由合成图像的运动的视觉效果的单独点组成。 技术结果在于提高了使用所要求保护的系统保护的产品的视觉控制的可靠性，这是由于创建了易于控制的图像运动效果以及所要求保护的系统的厚度的减小。 本发明可以使用已经可用的标准设备来实现。

    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    15.
    发明授权
    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微光刻投影曝光设备中的照明系统

    公开(公告)号：EP2115522B1

    公开(公告)日：2012-04-18

    申请号：EP07820745.3

    申请日：2007-10-01

    申请人： Carl Zeiss SMT GmbH

    发明人： FIOLKA, Damian ,  MAUL, Manfred ,  SCHWAB, Markus ,  SEITZ, Wolfgang ,  DITTMANN, Olaf

    IPC分类号： G02B27/28 ,  G03F7/20

    CPC分类号： G03F7/70191 ,  G02B3/0056 ,  G02B5/1876 ,  G02B27/283 ,  G02B27/285 ,  G02B27/286 ,  G03F7/70566

    摘要： The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising a depolariser (10, 500-900) which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser (10, 500-900) and a microlens array (20) which is arranged upstream of the light mixing system in the light propagation direction and in which a plurality of microlenses (20a, 20b,... ) are arranged with a periodicity, wherein the depolariser (10, 500-900) is such that a contribution afforded by interaction of the depolariser (10, 500-900) on the one hand with the periodicity of the microlens array (20) on the other hand, to a residual polarisation distribution occurring in a pupil plane (PP) arranged downstream of the microlens array (20) in the light propagation direction has a maximum degree of polarisation of not more than 5%.