公开(公告)号：EP1770440A3

公开(公告)日：2012-05-09

申请号：EP06020399.9

申请日：2006-09-28

申请人： FUJIFILM Corporation

发明人： Tarutani, Shinji

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0395 ,  G03F7/0758 ,  Y10S430/114 ,  Y10S430/136

摘要： A pattern forming method comprising: coating a resist composition on a substrate; adjusting a rotational speed of the substrate within a range of 500 to 1,500 rpm so that a film thickness of the resist composition coated is adjusted; and subjecting the resist composition to drying, exposure and development, wherein the resist composition includes: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation; (B) a resin of which dissolution rate in an alkali developer increases under the action of an acid; (C) a mixed solvent; and (D) a surfactant, and the mixed solvent (C) includes at least one member selected from a group A of solvents and at least one member selected from a group B of solvents, or includes at least one member selected from the group A of solvents and at least one member selected from a group C of solvents: Group A: propylene glycol monoalkyl ether carboxylates, Group B: propylene glycol monoalkyl ethers, alkyl lactates, acetic acid esters, one of chain and cyclic ketones, and alkoxyalkyl propionates, and Group C: γ-butyrolactone, ethylene carbonate and propylene carbonate.

公开(公告)号：EP2031445A3

公开(公告)日：2009-05-13

申请号：EP08016147.4

申请日：2005-08-18

申请人： FUJIFILM Corporation

发明人： Tarutani, Shinji ,  Takahashi, Hyou ,  Wada, Kenji

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392

摘要： The present invention relates to a chemical amplification resist composition comprising:
(A) a resin increasing the solubility in an alkali developer by the action of an acid;
(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation;
(C) a compound having a pKa value of 4-15 selected from formulae (FAD-II) and (FAD-III):

wherein
R a105 each individually is F or perfluoroalkyl;
n is 1 or 2, and (n+m) = 6;
R a106 each individually is F or perfluoroalkyl; and
A a102 is a bond or a divalent organic group; and

(D) a solvent.
Also, the invention relates to a pattern-forming method comprising; forming a resist film with the above composition and exposing and developing the resist film

公开(公告)号：EP1770440A2

公开(公告)日：2007-04-04

申请号：EP06020399.9

申请日：2006-09-28

申请人： FUJIFILM Corporation

发明人： Tarutani, Shinji

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0395 ,  G03F7/0758 ,  Y10S430/114 ,  Y10S430/136

摘要： A pattern forming method comprising: coating a resist composition on a substrate; adjusting a rotational speed of the substrate within a range of 500 to 1,500 rpm so that a film thickness of the resist composition coated is adjusted; and subjecting the resist composition to drying, exposure and development, wherein the resist composition includes: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation; (B) a resin of which dissolution rate in an alkali developer increases under the action of an acid; (C) a mixed solvent; and (D) a surfactant, and the mixed solvent (C) includes at least one member selected from a group A of solvents and at least one member selected from a group B of solvents, or includes at least one member selected from the group A of solvents and at least one member selected from a group C of solvents: Group A: propylene glycol monoalkyl ether carboxylates, Group B: propylene glycol monoalkyl ethers, alkyl lactates, acetic acid esters, one of chain and cyclic ketones, and alkoxyalkyl propionates, and Group C: γ-butyrolactone, ethylene carbonate and propylene carbonate.

摘要翻译： 一种图案形成方法，包括：在基材上涂布抗蚀剂组合物; 调整基板的旋转速度在500〜1500rpm的范围内，调整涂布的抗蚀剂组合物的膜厚; 并且对抗蚀剂组合物进行干燥，曝光和显影，其中抗蚀剂组合物包括：（A）在用光化射线和辐射之一照射时能够产生酸的化合物; （B）在碱性显影剂中的溶解速率在酸的作用下增加的树脂; （C）混合溶剂; 和（D）表面活性剂，并且混合溶剂（C）包括选自溶剂组A和选自B组溶剂中的至少一种的至少一种，或者包括选自A组 的溶剂和选自溶剂组C中的至少一种：A组：丙二醇单烷基醚羧酸酯，B组：丙二醇单烷基醚，乳酸烷基酯，乙酸酯，链和环酮之一和烷氧基烷基丙酸酯， 和C组：3-丁内酯，碳酸亚乙酯和碳酸亚丙酯。