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    Positive photosensitive composition and pattern forming method using the same
    6.
    发明公开
    Positive photosensitive composition and pattern forming method using the same 审中-公开
    该正型感光性组合物和方法，用于形成结构，使得

    公开(公告)号：EP1739483A3

    公开(公告)日：2011-12-28

    申请号：EP06013239.6

    申请日：2006-06-27

    申请人： FUJIFILM Corporation

    发明人： Kodama, Kunihiko ,  Nishiyama, Fumiyuki

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0395

    摘要： A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) an alkali-soluble group and (b) a group capable of decomposing under an action of an alkali to produce an alkali-soluble group, and the resin (B2) does not have a group capable of decomposing under an action of an acid; and a pattern forming method using the same.

    Chemically amplified positive resist composition for EB or EUV lithography and patterning process
    8.
    发明公开
    Chemically amplified positive resist composition for EB or EUV lithography and patterning process 有权
    Strukturierungsverfahren手套EBV-EUV-Lithographie

    公开(公告)号：EP2360527A1

    公开(公告)日：2011-08-24

    申请号：EP11001082.4

    申请日：2011-02-10

    申请人： Shin-Etsu Chemical Co., Ltd.

    发明人： Masunaga, Keiichi ,  Watanabe, Satoshi ,  Tanaka, Akinobu ,  Domon, Daisuke

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

    摘要： A chemically amplified positive resist composition for EB or EUV lithography is provided comprising (A) a polymer or a blend of polymers wherein a film of the polymer or polymer blend is insoluble in alkaline developer, but turns soluble under the action of acid, (B) an acid generator, (C) a basic compound, and (D) a solvent. The basic compound (C) is a polymer comprising recurring units bearing a side chain having a secondary or tertiary amine structure as a basic active site and constitutes a part or the entirety of the polymer or polymers as component (A).

    摘要翻译： 提供了用于EB或EUV光刻的化学放大型正性抗蚀剂组合物，其包含（A）聚合物或聚合物共混物，其中聚合物或聚合物共混物的膜不溶于碱性显影剂，但在酸的作用下变得可溶（B ）酸产生剂，（C）碱性化合物和（D）溶剂。 碱性化合物（C）是包含具有作为碱性活性位点的具有仲胺结构或叔胺结构的侧链的重复单元的聚合物，并且构成作为组分（A）的聚合物或聚合物的一部分或全部。