公开(公告)号：EP1475684A4

公开(公告)日：2005-09-07

申请号：EP02781829

申请日：2002-11-22

申请人： FUJIKIN KK ,  TOKYO ELECTRON LTD

发明人： OHMI TADAHIRO ,  UNO TOMIO ,  NAKAMURA OSAMU ,  IKEDA NOBUKAZU ,  DOHI RYOUSUKE ,  NISHINO KOUJI ,  MATSUMOTO ATSUSHI ,  SUGIYAMA KAZUHIKO ,  INUI SHUJIRO ,  SAKAI TAIJI ,  UEYAMA MASANORI

IPC分类号： G01F1/00 ,  G01F1/36 ,  G01F1/42 ,  G05D7/06

CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761

摘要： An advanced pressure type flow control device capable of accurately controlling a flow by using an experimental flow expression established to accurately fit to the actual flow of compressible fluid in a non-critical area, wherein the experimental flow expression of the compressible fluid in the non-critical area non-sound velocity area is expressed as Qc = KP2m P1 - P2n, and the fluid flow passing through an orifice 4 is calculated by using the expression Qc = KP2m P1 - P2n K is a proportional constant, m and n are constants so that the flow can be accurately and rapidly controlled to a specified one, and a pressure ratio P2/P1 = r provided by an upstream side pressure P1 and a downstream side pressure P2 is always compared with a critical value rc and the flow is calculated by using an expression Qc = KP1 under the critical condition of r rc so that the flow can be accurately and rapidly controlled to the specified one in correspondence to all conditions of the fluid.

摘要翻译： 一种先进的压力型流量控制装置，其能够通过使用所建立的实验流量表达准确地控制流量，所述实验流量表达准确地适应非临界区域中的可压缩流体的实际流量，其中， 临界区域非声速区域表示为Qc = KP2mP1-P2n，并且通过节流孔4的流体流量通过使用以下表达式来计算Qc = KP2m P1-P2n K是比例常数，m和n是常数 可以将流量精确而快速地控制到特定的流量，并且总是将由上游侧压力P1和下游侧压力P2提供的压力比P2 / P1 = r与临界值rc进行比较，并且通过 在r rc的非临界条件下使用表达式Qc = KP2m P1-P2n，从而可以将流量精确且快速地控制为 指定的一个对应于流体的所有条件。

公开(公告)号：EP1126347A4

公开(公告)日：2004-11-03

申请号：EP00948265

申请日：2000-07-27

申请人： TOKYO ELECTRON LTD ,  FUJIKIN KK ,  OHMI TADAHIRO ,  IIDA SEIICHI

发明人： OHMI TADAHIRO ,  IIDA SEIICHI ,  KAGATSUME SATOSHI ,  HIROSE JUN ,  FUKASAWA KAZUO ,  KOIZUMI HIROSHI ,  NAGAOKA HIDEKI ,  UNO TOMIO ,  NISHINO KOUJI ,  IKEDA NOBUKAZU ,  DOHI RYOUSUKE ,  IDETA EIJI

IPC分类号： G01F1/36 ,  F16K37/00 ,  G05B23/02 ,  G05D7/06 ,  F16K17/22 ,  G01D21/00

CPC分类号： G05B23/0235 ,  G05B23/0256 ,  G05D7/0635 ,  Y10T137/0396 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/8326

摘要： A method for detecting abnormal flow rate by easily detecting an obstruction of an orifice while a fluid pressure flow rate controller using an orifice is controlling the flow rate. The method uses a flow rate controller (FCS) so as to calculate the flow rate Qc on the downstream side when the upstream-side pressure P1 is maintained at a value about twice or more the downstream-side pressure P2 from Qc=KP1 (K: constant) and to control the operation of a control valve (CV) according to a signal Qy representing the difference between the calculated flow rate Qc and a preset flow rate Qs. A testing circuit or flow rate setting circuit provided separately outputs a testing signal ΔQs having a testing amplitude V0 to the control valve (CV). The pressure amplitude V of a pressure variation ΔP1 of the upstream-side pressure P1 occurring in response to the opening/closing of the control valve (CV) is measured. When the pressure amplitude V decreases below a limit amplitude Vt, the obstruction of the orifice is announced, thus implementing the method. If the testing signal ΔQs is superimposed on a steady-state preset flow rate signal Qs0 and outputted together from the testing circuit or the flow rate setting circuit to the control valve (CV), an abnormal flow rate can be detected while controlling the flow rate by using the steady-state preset flow rate signal Qs0.

公开(公告)号：EP0952505A4

公开(公告)日：2004-04-21

申请号：EP98937819

申请日：1998-08-13

申请人： FUJIKIN KK ,  TOKYO ELECTRON LTD ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  KAGAZUME TETU ,  SUGIYAMA KAZUHIKO ,  DOHI RYOUSUKE ,  UNO TOMIO ,  NISHINO KOUJI ,  FUKUDA HIROYUKI ,  IKEDA NOBUKAZU ,  YAMAJI MICHIO

IPC分类号： F16K17/22 ,  G05D7/06 ,  F16K7/14 ,  F16K7/16 ,  G05D16/20

CPC分类号： G05D7/0647 ,  Y10T137/7759 ,  Y10T137/7761

摘要： A pressure type flow rate control apparatus to be used in a gas supply system for semiconductor manufacturing equipment, which calculates a flow rate (Q = KP1) by using a detected pressure P1 of a pressure detector (4) installed between an orifice (5) and a control valve provided upstream of the orifice (5) and outputs the difference between the calculated flow rate and a flow rate control signal as a control signal to the control valve. The orifice (5) is formed as a direct touch type metal diaphragm, and an annular gap between a valve seat and a diaphragm is made variable to allow the flow rate control range to be changed easily.