摘要:
A fluid supply apparatus comprising a pressure flow controller for controlling the rate of flow of fluid, a fluid selector valve for opening/closing the fluid passage on the secondary side, and a fluid supply controller for controlling the operation of them, wherein the pressure flow controller is provided with an orifice (5), a control valve (1) provided on the upstream side of the orifice (5), a pressure sensor (3) provided between the control valve (1) and the orifice (5), and an operation controller (6) for outputting to a driver (2) of the control valve (1) a control signal (Qy) representing the difference between a rate-of-flow signal (Qc=KP1) generated by calculation based on the pressure (P1) measured by the pressure sensor (3) and a rate-of-flow command signal (Qs), and the pressure (P1) on the upstream side of the orifice (5) is adjusted by opening/closing the control valve (1) so as to regulate the rate of flow on the downstream side of the orifice (5).
摘要:
An orifice for use in pressure type flow rate control unit which can be manufactured easily and inexpensively, and which has a linear relationship between pressure P1 upstream of the orifice and the flow rate over a wide range of pressure ratio P2/P1 (where P1 is the pressure upstream of the orifice and P2 is the pressure downstream of same), with the flow rate characteristic relationship among a plurality of orifices being easily adjustable. More specifically, the orifice has a structure comprising a tapered inlet section (1) wherein one open end of a bottom hole (6) bored into a main body member (D) is cut into a shape like the mouthpiece of a trumpet, and a short drawn parallel part (2) continuing therefrom; and a short expanded tapered section (3) formed by expanding the diameter of the other open end of the bottom hole (6) and continuing from the drawn parallel part (2), and an expanded parallel part (4) continuing therefrom.
摘要:
An annular recess portion (7) is provided in an end face of a synthetic resin-made first joint member (2) and an annular projection portion (8) is provided on an end face of a synthetic resin-made second joint member (3). The projection portion (8) is fitted into an opening portion of the recess portion (7) into which a synthetic resin-made gasket (4) is fitted. When a pipe joint(1) is tightened adequately, the inner face of the recess portion (7) of the first joint member (2) and the outer face of the projection portion (8) of the second joint member (3) are in close contact with each other over substantially the entire surface through the gasket (4), a portion (2d) located radially inside the recess portion in the end face of the first joint member (2) and a portion (3d) located radially inside the projection portion on the end face of the second joint member (3) are in close contact with each other over substantially the entire surface area, and a portion (2e) located radially outside the recess portion in the end face of the first joint member (2) and a portion (3e) located radially outside the projection portion on the end face of the second joint member (3) are also in contact with each other over substantially the entire surface area.
摘要:
A fluid feeding device having a plurality of flow paths disposed in parallel with each other starting at a regulator for pressure regulation, wherein a mass flow controller for flow control or a pressure system flow control device is disposed in each flow path so that the opening and closing operations for fluid supply in each flow path do not provide a transient variation in a stable supply to the other flow paths and, when the fluid supply in a flow path is changed from close to open, a set flow rate is reached a specified delay time after the start of the operation of the mass flow controller in that flow path.
摘要:
A pressure-type flow control device is used to permit a high-accuracy control of the flow rate of a clustering fluid such as HF gas to be supplied to a vacuum chamber or the like within a flow rate range of about 3-300 SCCM. Specifically, a method of controlling the flow rate of a clustering fluid that uses a pressure-type flow control device where a flow rate Q of a gas flowing through an orifice is computed as Q=KP1 (K is constant) with a ratio P2/P1 between an orifice-upstream-side gas pressure P1 and a downstream-side gas pressure P2 kept up to the critical pressure ratio of the gas, wherein the pressure-type flow control device is heated to at least 40°C, or the clustering fluid is added with a dilute gas to be kept at up to a partial pressure, thereby allowing the clustering fluid, produced by dissociating the association of molecules and then keeping them in a monomolecular state, to flow through the orifice.
摘要:
An advanced pressure type flow control device capable of accurately controlling a flow by using an experimental flow expression established to accurately fit to the actual flow of compressible fluid in a non-critical area, wherein the experimental flow expression of the compressible fluid in the non-critical area non-sound velocity area is expressed as Qc = KP2m P1 - P2n, and the fluid flow passing through an orifice 4 is calculated by using the expression Qc = KP2m P1 - P2n K is a proportional constant, m and n are constants so that the flow can be accurately and rapidly controlled to a specified one, and a pressure ratio P2/P1 = r provided by an upstream side pressure P1 and a downstream side pressure P2 is always compared with a critical value rc and the flow is calculated by using an expression Qc = KP1 under the critical condition of r rc so that the flow can be accurately and rapidly controlled to the specified one in correspondence to all conditions of the fluid.
摘要:
A pressure type flow rate control apparatus to be used in a gas supply system for semiconductor manufacturing equipment, which calculates a flow rate (Q = KP1) by using a detected pressure P1 of a pressure detector (4) installed between an orifice (5) and a control valve provided upstream of the orifice (5) and outputs the difference between the calculated flow rate and a flow rate control signal as a control signal to the control valve. The orifice (5) is formed as a direct touch type metal diaphragm, and an annular gap between a valve seat and a diaphragm is made variable to allow the flow rate control range to be changed easily.
摘要:
The present invention provides a semiconductor device manufacturing line for applying a series of processes on a semiconductor substrate, and forming an integrated circuit on the semiconductor substrate by employing a semiconductor wafer having a diameter of 6 inches (150 +/- 3 mm: SEAJ specification) or less for the semiconductor substrate. This manufacturing line comprises two sub-lines conforming to the same specifications, each of these sub-lines is composed of a series of processing units including a film forming unit, a pattern exposure unit, an etching unit, and a test unit. In at least one pattern exposure unit and one etching unit, fine processing of 0.3 mu m or less can be performed.
摘要:
A differential pressure type flow meter in which production cost is lowered by simplifying the structure and high-accuracy measurement of flow rate can be carried out in real time under inline state with an error E not higher than (1%SP) over a wide flow rate range of 100%-1%. The differential pressure type flow meter comprises an orifice, a detector of pressure P1 on the upstream side of the orifice, a detector of pressure P2 on the downstream side of the orifice, a detector of fluid temperature T on the upstream side of the orifice, and a control operation circuit for operating the flow rate Q of fluid passing through the orifice using detected pressures P1 and P2 and detected temperature T from respective detectors, wherein the flow rate Q of fluid is operated according to the following expression; Q=C1.P1/√T.((P2/P1) -(P2/P1) ) (where, C1 is a proportional constant, m and n are constants).