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    CHROMIUM PLATING
    32.
    发明公开
    CHROMIUM PLATING 审中-公开
    电镀

    公开(公告)号：EP1778888A1

    公开(公告)日：2007-05-02

    申请号：EP05738127.9

    申请日：2005-04-01

    申请人： Chan, Waiman

    发明人： Chan, Waiman

    IPC分类号： C23C14/14 ,  C23C28/02 ,  C23C28/00 ,  C25D3/06 ,  C25D5/12

    CPC分类号： C25D5/48 ,  C23C28/021 ,  C23C28/023 ,  C23C28/025 ,  C25D3/06

    摘要： A method of chromium coating a substrate is described, which method comprises: a) depositing, preferably electrodepositing, a metallic layer onto the substrate comprising chromium from a plating bath that includes trivalent chromium and no, or substantially no, hexavalent chromium; b) physical vapor depositing a layer comprising chromium cn the layer deposited from step a). In one embodiment, in step a), the layer is chromium and is electrodeposited from a plating bath that includes trivalent chromium and no, or substantially no, hexavalent chromium. The metallic layer deposited in step a) is preferably a metal or an alloy of two or more metals and may be selected from the group consisting of chromium, copper, nickel, cobalt, zinc, lead iron, palladium and tin and alloys thereof, e.g. copper tin, copper zinc, tin lead, tin nickel, tin cobalt, tin zinc, iron nickel, cobalt nickel, zinc nickel, zinc iron, zinc iron nickel, zinc iron cobalt or palladium nickel. Copper and nickel are especially preferred. The coating formed by the method has a blue sheen that is usually associated with chromium electrodeposited from hexavalent chromium baths without having to use a hexavalent chromium bath, which is highly toxic.

    Chrome plated engine valve
    35.
    发明公开
    Chrome plated engine valve 失效
    Chromplattiertes摩托车

    公开(公告)号：EP0576190A1

    公开(公告)日：1993-12-29

    申请号：EP93304634.4

    申请日：1993-06-15

    申请人： EATON CORPORATION

    发明人： Schachameyer, Steven Roy ,  Narasimhan, Sundaram Lakshmi ,  Bujalski, Paul Andrew

    IPC分类号： C25D3/06 ,  F01L3/04

    CPC分类号： C25D3/06 ,  C25D5/50 ,  F01L3/04 ,  F02B3/06

    摘要： An internal combustion engine valve (100) is provided having a stem (4) onto which a plating or coating of trivalent chromium is electrodeposited and which is then heated at a temperature of at least about 150°F for at least about 3 hours to provide a wear resistant surface that is superior to coatings of hexvalent chromium heretofore used for such purpose.

    摘要翻译： 提供内燃机阀（100），其具有杆（4），三价铬的镀层或涂层电沉积在其上，然后在至少约150°F的温度下加热至少约3小时，以提供 耐磨表面优于迄今为止用于此目的的六价铬的涂层。

    Electrodeposition of chromium and its alloys
    37.
    发明公开
    Electrodeposition of chromium and its alloys 失效
    电镀铬及其合金

    公开(公告)号：EP0079768A1

    公开(公告)日：1983-05-25

    申请号：EP82306018.1

    申请日：1982-11-11

    申请人： International Business Machines Corporation

    发明人： Barclay, Donald John ,  Morgan, William Morris ,  Vigar, James Michael Linford

    IPC分类号： C25D3/06 ,  C25D3/56

    CPC分类号： C25D3/56 ,  C25D3/06

    摘要： A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and organic compound having a -C=S group or a -C-S group within the molecule for promoting chromium deposition. The complexant is preferably selected so that the stability constant K, of the chromium complex is in the range 10 8 2 M -1 .
    Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid or 5-sulphosalicylic acid. Suitable organic compounds having a -C-S group include thiourea, N-monoallyl thiourea, N-mono-p-tolyl thiourea, thioacetamide, tetramethyl thiuram monosulphide, tetraethyl thiuram disulphide and diethyldithiocarbonate. Suitable organic compounds having a -C=S group include mercaptoacetic and/or mercaptopropianic acid.

    摘要翻译： 含有三价铬离子的铬电镀电解质，络合剂，缓冲剂和用于促进铬沉积的分子内具有-C = S基团或-C-S基团的有机化合物。 优选选择络合剂，使得铬络合物的稳定常数K i在108

    VERFAHREN ZUR PASSIVIERUNG DER OBERFLÄCHE EINES WEISSBLECHS UND ELEKTROLYSESYSTEM ZUR DURCHFÜHRUNG DES VERFAHRENS
    38.
    发明公开
    VERFAHREN ZUR PASSIVIERUNG DER OBERFLÄCHE EINES WEISSBLECHS UND ELEKTROLYSESYSTEM ZUR DURCHFÜHRUNG DES VERFAHRENS 审中-公开

    公开(公告)号：EP4159896A3

    公开(公告)日：2023-07-26

    申请号：EP22187442.3

    申请日：2022-07-28

    申请人： ThyssenKrupp Rasselstein GmbH

    发明人： Molls, Christoph ,  Bergholz, Birgit ,  Menzel, Gerhard

    IPC分类号： C25D3/06 ,  C25D5/50 ,  C25D9/08 ,  C25D9/10 ,  C25D11/34

    摘要： Die Erfindung betrifft ein Verfahren zur Passivierung der Oberfläche eines Weißblechs umfassend eine elektrolytische Abscheidung einer chromoxid-/chromhydroxidhaltigen Passivierungsschicht auf der Oberfläche, wobei die elektrolytische Abscheidung der Passivierungsschicht zumindest teilweise aus einer Elektrolytlösung (E) erfolgt, welche eine dreiwertige Chromverbindung, wenigstens ein Salz zur Erhöhung der Leitfähigkeit und wenigstens eine Säure oder eine Base zur Einstellung eines gewünschten pH-Werts enthält und frei von organischen Komplexbildnern sowie frei von Pufferungsmitteln ist. Um den Anteil des Chromoxids in der Passivierungsschicht zu erhöhen, wird nach der elektrolytischen Abscheidung der Passivierungsschicht das passivierte Weißblech einer thermischen Behandlung unterzogen, in der das passivierte Weißblech während einer Behandlungszeit von mindestens 0,5 Sekunden auf eine Behandlungstemperatur von 100°C oder mehr gehalten wird.

    METHOD FOR ELECTROLYTICALLY DEPOSITING A CHROMIUM OR CHROMIUM ALLOY LAYER ON AT LEAST ONE SUBSTRATE
    40.
    发明公开
    METHOD FOR ELECTROLYTICALLY DEPOSITING A CHROMIUM OR CHROMIUM ALLOY LAYER ON AT LEAST ONE SUBSTRATE 审中-公开

    公开(公告)号：EP4170071A1

    公开(公告)日：2023-04-26

    申请号：EP22214580.7

    申请日：2018-04-04

    申请人： Atotech Deutschland GmbH & Co. KG

    发明人： Walter, Anke ,  Yevtushenko, Oleksandra ,  Paulig, Franziska

    IPC分类号： C25D3/06 ,  C25D5/00 ,  C25D17/10

    摘要： The present invention relates to a method for electrolytically depositing a chromium or chromium alloy layer on at least one substrate, the method comprising the steps
    (a) providing an aqueous deposition bath with a pH in the range from 4.1 to 7.0,
    - comprising trivalent chromium ions,
    - comprising 0 mg/L to 200 mg/L hexavalent chromium, based on the total volume of the deposition bath, and
    - not comprising boron containing compounds,

    (b) providing the at least one substrate and at least one anode,
    (c) immersing the at least one substrate in the aqueous deposition bath and applying an electrical direct current such that the chromium or chromium alloy layer is deposited on the at least one substrate, wherein
    the at least one substrate forms the cathode having a total cathodic current density and the at least one anode having a total anodic current density,
    with the proviso that
    - the total anodic current density is 6 A/dm 2 or more,
    - the total cathodic current density is 18 A/dm 2 or more,
    - the at least one substrate and the at least one anode are present in the deposition bath such that the trivalent chromium ions are in contact with the at least one anode.