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119 条记录 (耗时 0.016 秒)

    RADIATION BEAM INTENSITY PROFILE SHAPER
    42.
    发明公开
    RADIATION BEAM INTENSITY PROFILE SHAPER 审中-公开
    强度分布前者的辐射BUNCH

    公开(公告)号：EP2928376A1

    公开(公告)日：2015-10-14

    申请号：EP13824011.4

    申请日：2013-11-28

    申请人： Koninklijke Philips N.V. ,  Philips GmbH

    发明人： KATCHALSKI, Tsvi ,  ROESSL, Ewald ,  LEVINSON, Reuven

    IPC分类号： A61B6/03 ,  A61B6/06 ,  A61B6/00 ,  G21K1/02 ,  G21K1/06

    摘要： An imaging system (500) includes a focal spot (510) that rotates along a path around an examination region (506) and emits radiation. A collimator (512) collimates the radiation, producing a radiation beam (516) that traverses a field of view (520) of the examination region and a subject or object therein. A detector array (522), located opposite the radiation source, across the examination region, detects radiation traversing the field of view and produces a signal indicative of the detected radiation. A beam shaper (524), located between the radiation source and the collimator, rotates in coordination with the focal spot and defines an intensity profile of the radiation beam. The beam shaper includes a plurality of elongate x-ray absorbing elements (606) arranged parallel to each other along a transverse direction with respect to a direction of the beam, separated from each other by a plurality of material free regions (604).

    ALIGNING SOURCE-GRATING-TO-PHASE-GRATING DISTANCE FOR MULTIPLE ORDER PHASE TUNING IN DIFFERENTIAL PHASE CONTRAST IMAGING
    43.
    发明公开
    ALIGNING SOURCE-GRATING-TO-PHASE-GRATING DISTANCE FOR MULTIPLE ORDER PHASE TUNING IN DIFFERENTIAL PHASE CONTRAST IMAGING 有权
    把源光栅到相位光栅距离相位VOTE MUCH多个订单在差分相位衬度成像

    公开(公告)号：EP2884899A1

    公开(公告)日：2015-06-24

    申请号：EP13783389.3

    申请日：2013-08-20

    申请人： Koninklijke Philips N.V. ,  Philips GmbH

    发明人： MARTENS, Gerhard ,  DAERR, Heiner ,  ISTEL, Thomas Detlef ,  ROESSL, Ewald ,  VAN STEVENDAAL, Udo

    IPC分类号： A61B6/00 ,  G01N23/20

    CPC分类号： A61B6/587 ,  A61B6/484 ,  A61B6/582 ,  A61B6/588 ,  A61B6/589 ,  G01N23/20025 ,  G01N23/20075 ,  G01N2223/643

    摘要： The present invention relates handling misalignment in an X-ray imaging system for differential phase contrast imaging. In order to provide a reduction for the pretuning and adjustment requirements for manufacture and maintenance in a differential phase contrast imaging system, an X-ray imaging system (10) for differential phase contrast imaging, is provided that comprises a differential phase contrast setup (12) with an X-ray source (14) and an X-ray detector (16), a grating arrangement (18) comprising a source grating (20), a phase grating (22) and an analyser grating (24), wherein the source grating is arranged between the X-ray source and the phase grating, and the analyser grating is arranged between the phase grating and the detector. Further, a moving arrangement for a relative movement between an object under examination and at least one of the gratings is provided, as well as a processing unit (32), and a translation arrangement (34) for translating the source grating. The phase grating, the analyser grating and the detector are provided as a rigid interferometer unit (36), in which the phase grating and the analyser grating are mounted in parallel to each other. The source grating is misaligned in respect to the interferometer unit such that moiré fringes are detectable in the plane of the detector. The processing unit is configured to detect moiré patterns in signals provided by the detector upon X-ray radiation. The processing unit is further configured to compute a translation signal (38) for translating the source grating for achieving a predetermined moiré pattern. The translation arrangement is configured to adjust the positioning of the source grating at least in the X-ray projection direction (30), based on the value of the translation signal.

    摘要翻译： 本发明涉及在用于微分相位对比成像的X射线成像系统中处理的未对准。 为了提供一种用于制造和维护在一个微分相位对比成像系统中的预调节和调整的要求的降低，X射线成像系统（10），用于微分相位对比成像，提供并包括差分相位衬设置（12 （），在X射线源14）和（在X射线检测器（16），一个光栅装置18），其包括22源光栅（20），相位光栅（）和（分析器光栅24），其中，所述 源光栅的X射线源和所述相位光栅和分析器光栅的相位光栅和检测器之间设置之间布置。 此外，对于上物体之间的受检查和光栅中的至少一个的相对运动的运动装置设置，以及一个处理单元（32），和用于转换源光栅的平移装置（34）。 相位光栅，所述分析器光栅和检测器被设置为刚性干涉仪单元（36），其中，所述相位光栅和分析器光栅被安装在平行于海誓山盟。 源光栅错位在相对于所述干涉计单元的搜索没有莫尔条纹是在检测器的平面中可检测的。 所述处理单元被配置成检测在X射线辐射由检测器提供的信号莫尔图案。 所述处理单元被进一步被配置为计算用于转换源光栅，用于实现预定的莫尔图案的平移信号（38）。 翻译装置被配置为调节所述源中的X射线投影方向（30）至少光栅的定位的基础上，翻译信号的值。

    SWITCHABLE PHASE STEPPING
    47.
    发明公开
    SWITCHABLE PHASE STEPPING 审中-公开

    公开(公告)号：EP3669783A1

    公开(公告)日：2020-06-24

    申请号：EP18215305.6

    申请日：2018-12-21

    申请人： Koninklijke Philips N.V.

    发明人： STEADMAN BOOKER, Roger ,  ROESSL, Ewald

    IPC分类号： A61B6/00 ,  G21K1/04 ,  G21K1/06 ,  G01N23/041 ,  G02F1/165 ,  G01V5/00

    摘要： Phase stepping for differential phase contrast and/or dark field x-ray imaging using a switchable grating in which particles in a reservoir are aligned into wall-like x-ray absorbing structures by inducing a standing wave in a medium in the reservoir. The standing wave is modified by a second ultrasound generator that modifies the standing wave such that the pressure nodes of the first standing wave shift position.