摘要:
A vacuum envelope (7) includes a flat face plate (1) having a phosphor screen (8) formed on the inner surface of the face plate (1), and a flat rear plate (3) opposed to the face plate with a side wall (2) interposed therebetween. A plurality of funnels (4) extend from the rear plate, and electron guns (12) are respectively enclosed in the necks of the funnels. The rear plate and the plurality of funnels are integrally formed of one single plate glass and are joined to face plate through the side wall. A plurality of reference surfaces (18) are formed on the inner surface of the rear plate, and ends of the plate support members (16) are respectively fixed to the reference surfaces.
摘要:
A system is disclosed for externally locating the geometric center of an internal lens element which requires that an external reference surface be accurately formed so as to lie concentrically with the central axis of the internal lens element. This is a accomplished in a pressing operation by precisely aligning and securing a ring element to a plunger member. Three points are then selected on the outer reference surface which are not only utilized for positioning the internal lens element for grinding an outer surface to a desired thickness, but also are utilized for aligning and affixing an external lens system in geometric alignment with the internal lens.
摘要:
Previously shielded image intensifier faceplates have been manufactured by a method which has a number of disadvantages, requiring difficult and expensive machining, and introducing distortions. These may be overcome by employing the invention, where a clear glass disc 13 and a black glass disc 14 are placed in a graphite mould 15 and located so that they fuse and form a block having a shape conforming to the internal configuration of the mould. Then the block need only be ground down to size and unwanted parts of the black glass removed.
摘要:
A method of making an electron permeable window is provided which entails depositing a thin film (31) of an inert, high strength material or compound having a low atomic number onto a substrate (33) by chemical vapor deposition (CVD). Following that deposition, a window pattern and window support perimeter are photolitho-graphically defined and the substrate is etched to leave the desired window assembly (35). For a particular class of materials including SiC, BN, B 4 C, Si 3 N 4 , and A1 4 C 3 , films are provided which are exceedingly tough and pinhole free, and which exhibit nearly zero internal stress. Furthermore, due to their extreme strength, these materials allow fabrication of extremely thin windows. In addition, because of their low atomic number and density, they have excellent electron penetration characteristics at low beam voltages (15 to 30kV), so that most conventional CRT deflection schemes can be used to direct the beam. Also, such films are remarkably resilient and chemically inert even when very thin and can easily withstand large pressure differences.