公开(公告)号：EP0480424A2

公开(公告)日：1992-04-15

申请号：EP91117296.3

申请日：1991-10-10

申请人： HITACHI, LTD.

发明人： Todokoro, Hideo ,  Takamoto, Kenji ,  Otaka, Tadashi

IPC分类号： H01J37/28 ,  H01J37/30

CPC分类号： G01B15/04 ,  G01B15/00 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/281

摘要： The disclosure discloses the invention of SEM that can inspect a groove or hole in the surface of a specimen (8) by irradiating the specimen with an high energy electron beam (4). The SEM is used in manufacturing process of semiconductor device to observe of configuration of the bottom of a deep hole.

摘要翻译： 本公开盘松动SEM的发明也可以通过在高能量电子束（4）照射试样检查试样中的（8）的表面中的凹槽或孔。 在SEM中制造半导体器件的过程中，观察了深刻的孔的底部的配置的使用。

公开(公告)号：EP0462554A2

公开(公告)日：1991-12-27

申请号：EP91109941.4

申请日：1991-06-18

申请人： HITACHI, LTD.

发明人： Matsui, Hironobu ,  Ichihashi, Mikio ,  Ueda, Shinjiroo ,  Otaka, Tadashi ,  Takahashi, Kazue

IPC分类号： H01J37/28 ,  H01J37/12 ,  H01J37/04 ,  H01J37/18

CPC分类号： H01J37/28 ,  H01J37/12 ,  H01J2237/18

摘要： Disclosed herein is a charged particle beam apparatus which comprise the components below operating as follows:
A charged particle beam generating system causes a charged particle source (1) to generate a charged particle beam (2). A charged particle beam focusing system focuses the charged particle beam onto a sample (8). A charged particle beam deflecting system (9) causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector (15) detects information obtained by irradiating the charged particle beam onto the sample. An image display system (16) displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The charged particle beam focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode (7) located closest to the sample. All of the lens electrodes except for the final electrode are supplied with positive voltages as opposed to a negative voltage to the final electrode when the charged particle beam is negatively charged (e.g., electron beam). All of the lens electrodes except for the final electrode are supplied with negative voltages as opposed to a positive voltage to the final electrode when the charged electron beam is positively charged (e.g., positive ion beam). The charged particle beam deflecting system is so constructed as to deflect the charged particle beam within the inner space of the plurality of lens electrodes excluding the final electrode.

摘要翻译： 本文公开了一种带电粒子束装置，其包括以下部件的操作如下：带电粒子束产生系统使带电粒子源（1）产生带电粒子束（2）。 带电粒子束聚焦系统将带电粒子束聚焦到样品（8）上。 带电粒子束偏转系统（9）使得聚焦的带电粒子束扫描样品的表面。 抽空系统排空带电粒子束通过的空间。 检测器（15）检测通过将带电粒子束照射到样品上而获得的信息。 图像显示系统（16）基于从检测器转发的检测信号，将样品表面上的信息的分布状态显示为图像。 带电粒子束聚焦系统完全由包含多个透镜电极的静电透镜构成，其中一个透镜电极是最靠近样品的最终电极（7）。 当带电粒子束带负电（例如电子束）时，除了最终电极之外的所有透镜电极都被提供与正电压相对的最终电极的正电压。 当带电的电子束带正电（例如，正离子束）时，除了最终电极之外的所有透镜电极都被提供与正电压相反的负电压。 带电粒子束偏转系统被构造成使得带电粒子束在除了最终电极之外的多个透镜电极的内部空间内偏转。

公开(公告)号：EP0422655A3

公开(公告)日：1991-10-09

申请号：EP90119523.0

申请日：1990-10-11

申请人： HITACHI, LTD.

发明人： Otaka, Tadashi

IPC分类号： H01J37/20

CPC分类号： H01J37/20

摘要： The charged-particle beam apparatus according to this invention is of the type in which a specimen is inserted between the upper and lower magnetic poles of an objective lens (1), and is constructed such that stages (9a, 9b, 11, 12), which are used to move a specimen in a desired direction, are mounted one on top another from the bottom wall of the objective lens (1), thus preventing the specimen from being affected by external vibration. Devices (9c, 30, 31, 32, 33, 100), which do not generate a magnetic field, are used to drive the stages. This enables the drive devices to be directly connected to the stages, so that the stages are moved accurately.

公开(公告)号：EP0409208A2

公开(公告)日：1991-01-23

申请号：EP90113785.1

申请日：1990-07-18

申请人： HITACHI, LTD.

发明人： Otaka, Tadashi

IPC分类号： H01J37/295

CPC分类号： H01J37/2955

摘要： An apparatus and a method of obtaining respec­tive electron channeling patterns from a plurality of grains on a sample (12) are disclosed. The sample is scanned by, for example, an electron beam two-dimension­ally to specify positions of each of the grains and the positions are compared with an irradiation position of the collimated electron beam for the electron channeling pattern. The sample is moved to cause the positions of each of the grains to coincide with the irradiation position of the collimated electron beam.

摘要翻译： 公开了一种从样品（12）上的多个晶粒获得各自的电子通道图案的装置和方法。 通过二维例如电子束扫描样品，以指定每个晶粒的位置，并将该位置与用于电子沟道图案的准直电子束的照射位置进行比较。 移动样品使每个晶粒的位置与准直电子束的照射位置一致。