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    Charged particle beam apparatus
    1.
    发明公开
    Charged particle beam apparatus 失效
    Ladungsträgerstrahlgerät。

    公开(公告)号：EP0462554A2

    公开(公告)日：1991-12-27

    申请号：EP91109941.4

    申请日：1991-06-18

    申请人： HITACHI, LTD.

    发明人： Matsui, Hironobu ,  Ichihashi, Mikio ,  Ueda, Shinjiroo ,  Otaka, Tadashi ,  Takahashi, Kazue

    IPC分类号： H01J37/28 ,  H01J37/12 ,  H01J37/04 ,  H01J37/18

    CPC分类号： H01J37/28 ,  H01J37/12 ,  H01J2237/18

    摘要： Disclosed herein is a charged particle beam apparatus which comprise the components below operating as follows:
    A charged particle beam generating system causes a charged particle source (1) to generate a charged particle beam (2). A charged particle beam focusing system focuses the charged particle beam onto a sample (8). A charged particle beam deflecting system (9) causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector (15) detects information obtained by irradiating the charged particle beam onto the sample. An image display system (16) displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The charged particle beam focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode (7) located closest to the sample. All of the lens electrodes except for the final electrode are supplied with positive voltages as opposed to a negative voltage to the final electrode when the charged particle beam is negatively charged (e.g., electron beam). All of the lens electrodes except for the final electrode are supplied with negative voltages as opposed to a positive voltage to the final electrode when the charged electron beam is positively charged (e.g., positive ion beam). The charged particle beam deflecting system is so constructed as to deflect the charged particle beam within the inner space of the plurality of lens electrodes excluding the final electrode.

    摘要翻译： 本文公开了一种带电粒子束装置，其包括以下部件的操作如下：带电粒子束产生系统使带电粒子源（1）产生带电粒子束（2）。 带电粒子束聚焦系统将带电粒子束聚焦到样品（8）上。 带电粒子束偏转系统（9）使得聚焦的带电粒子束扫描样品的表面。 抽空系统排空带电粒子束通过的空间。 检测器（15）检测通过将带电粒子束照射到样品上而获得的信息。 图像显示系统（16）基于从检测器转发的检测信号，将样品表面上的信息的分布状态显示为图像。 带电粒子束聚焦系统完全由包含多个透镜电极的静电透镜构成，其中一个透镜电极是最靠近样品的最终电极（7）。 当带电粒子束带负电（例如电子束）时，除了最终电极之外的所有透镜电极都被提供与正电压相对的最终电极的正电压。 当带电的电子束带正电（例如，正离子束）时，除了最终电极之外的所有透镜电极都被提供与正电压相反的负电压。 带电粒子束偏转系统被构造成使得带电粒子束在除了最终电极之外的多个透镜电极的内部空间内偏转。

    Synchrotron radiation source
    6.
    发明公开
    Synchrotron radiation source 失效
    同步辐射Strahlungsquelle。

    公开(公告)号：EP0278504A2

    公开(公告)日：1988-08-17

    申请号：EP88101999.6

    申请日：1988-02-11

    申请人： HITACHI, LTD. ,  NIPPON TELEGRAPH AND TELEPHONE CORPORATION ,  HITACHI ENGINEERING AND SERVICES CO., LTD.

    发明人： Matsumoto, Manabu ,  Ikeguchi, Takashi ,  Ueda, Shinjiroo ,  Sonobe, Tadasi ,  Murashita, Toru ,  Ido, Satoshi ,  Kuroishi, Kazuo ,  Kazawa, Yoshiaki ,  Kakiuchi, Shunji ,  Kobari, Toshiaki

    IPC分类号： H05H7/00 ,  H05H13/04

    CPC分类号： H05H7/00

    摘要： An industrial compact synchrotron radiation source with improved vacuum to prolong life-time of a charged particle beam. The synchrotron supplies highly stable, intense synchrotron radiation. In the source, a charged particle beam bending duct (1) forming a vacuum chamber through which the charged particle beam circulates, is encompassed by a bending electromagnet (2). At least one SR guide duct (3) for guiding the radia­tion to the outside extends from the outer circumferential wall (1e) of the bending duct. The SR guide duct is connected through a gate valve (5) to an SR beam line duct (7) for guiding the SR beam to an object to be worked on. A vacuum pump (4) is disposed on the side of the gate valve, close to an orbit (A) of the charged particle beam. The SR guide duct extending from the outer circumferential wall of the bending duct takes the form of a divergent duct which is widened in accordance with a spreading angle (ϑs) of the SR beam travelling through the SR guide duct.

    摘要翻译： 具有改善真空度的工业致密同步加速器辐射源，以延长带电粒子束的寿命。 同步加速器提供高度稳定，强烈的同步辐射。 在源中，形成带电粒子束循环的真空室的带电粒子束弯曲管道（1）由弯曲电磁体（2）包围。 用于将辐射引导到外部的至少一个SR引导管道（3）从弯曲管道的外周壁（1e）延伸。 SR引导管通过闸阀（5）连接到SR梁线管道（7），用于将SR梁引导到待加工物体。 真空泵（4）设置在闸阀侧面，靠近带电粒子束的轨道（A）。 从弯曲管道的外周壁延伸的SR导向管呈采取扩散管道的形式，该管道根据穿过SR导管的SR束的扩展角度（θs）加宽。

    Charged particle beam apparatus
    9.
    发明公开
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号：EP0462554A3

    公开(公告)日：1992-06-24

    申请号：EP91109941.4

    申请日：1991-06-18

    申请人： HITACHI, LTD.

    发明人： Matsui, Hironobu ,  Ichihashi, Mikio ,  Ueda, Shinjiroo ,  Otaka, Tadashi ,  Takahashi, Kazue

    IPC分类号： H01J37/28 ,  H01J37/12 ,  H01J37/04 ,  H01J37/18

    CPC分类号： H01J37/28 ,  H01J37/12 ,  H01J2237/18

    摘要： Disclosed herein is a charged particle beam apparatus which comprise the components below operating as follows:
    A charged particle beam generating system causes a charged particle source (1) to generate a charged particle beam (2). A charged particle beam focusing system focuses the charged particle beam onto a sample (8). A charged particle beam deflecting system (9) causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector (15) detects information obtained by irradiating the charged particle beam onto the sample. An image display system (16) displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The charged particle beam focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode (7) located closest to the sample. All of the lens electrodes except for the final electrode are supplied with positive voltages as opposed to a negative voltage to the final electrode when the charged particle beam is negatively charged (e.g., electron beam). All of the lens electrodes except for the final electrode are supplied with negative voltages as opposed to a positive voltage to the final electrode when the charged electron beam is positively charged (e.g., positive ion beam). The charged particle beam deflecting system is so constructed as to deflect the charged particle beam within the inner space of the plurality of lens electrodes excluding the final electrode.

    摘要翻译： 本文公开了一种带电粒子束装置，其包括以下部件，其操作如下：带电粒子束产生系统使带电粒子源（1）产生带电粒子束（2）。 带电粒子束聚焦系统将带电粒子束聚焦到样本（8）上。 带电粒子束偏转系统（9）使聚焦的带电粒子束扫描样本的表面。 抽空系统抽空带电粒子束通过的空间。 检测器（15）检测通过将带电粒子束照射到样本上而获得的信息。 图像显示系统（16）基于从检测器发送的检测信号，将信息在样本表面上的分布状态显示为图像。 带电粒子束聚焦系统完全由包含多个透镜电极的静电透镜构成，其中一个透镜电极是最靠近样品的最终电极（7）。 当带电粒子束带负电荷（例如电子束）时，除了最终电极以外的所有透镜电极都被提供有正电压而不是负电压到最终电极。 当带电电子束带正电（例如，正离子束）时，除最后电极之外的所有透镜电极都被提供负电压而不是正电压到最终电极。 带电粒子束偏转系统被构造成使带电粒子束在除最终电极之外的多个透镜电极的内部空间内偏转。