公开(公告)号：EP1887106B1

公开(公告)日：2011-04-20

申请号：EP06746541.9

申请日：2006-05-17

申请人： Sumitomo Electric Industries, Ltd.

发明人： OKADA, Issei, c/o Osaka Works of Sumiomo E. I. ,  SHIMODA, Kohei, c/o Osaka Works of Sumiomo E. I.

IPC分类号： C23C26/00 ,  C22C5/06 ,  H01B1/22 ,  H01B5/14 ,  H01B13/00

CPC分类号： C23C24/08 ,  C22C5/06 ,  C23C24/00 ,  C23C26/00 ,  H01B1/02 ,  H01B1/22 ,  H05K1/097 ,  Y10T428/12 ,  Y10T428/12014 ,  Y10T428/24355 ,  Y10T428/24917

摘要： Disclosed is a metal coating film formed by applying a metal particle dispersion containing meal fine particles, water and a dispersing agent having a molecular weight of 2,000-30,000 to the surface of a base and firing it. This metal coating film is composed of an alloy containing (1) Ag and (2) at least one metal selected from the group consisting of Au, Pt, Pd, Ru, Ir, Sn, Cu, Ni, Fe, Co, Ti and In, in which alloy the Ag content is 80-99.9 at% relative to the total alloy and the average crystal grain size is 0.2-5 μm. By having such a constitution, the metal coating film has low surface roughness, excellent smoothness and excellent denseness, while exhibiting excellent adhesion to the base and excellent etching properties. Also disclosed are a method for forming such a metal coating film, and a metal wiring obtained by patterning such a metal coating film. The coating film is fired at a temperature not more than 700˚C.

公开(公告)号：EP1736558A4

公开(公告)日：2009-06-17

申请号：EP04793205

申请日：2004-10-29

申请人： TANAKA PRECIOUS METAL IND

发明人： OBATA TOMOKAZU ,  YANAGIHARA HIROSHI

IPC分类号： C22C5/06 ,  G11B7/258 ,  G11B7/2585 ,  G11B7/259 ,  G11B7/26

CPC分类号： C22C5/06 ,  C22C5/08 ,  G11B7/258 ,  G11B7/2585 ,  G11B7/259 ,  G11B7/268

摘要： A silver alloy for a reflective film of an optical recording medium which comprises silver as the primary component thereof and at least one metallic element having a melting point lower than that of silver as a first additive element. The first additive element is preferably aluminum, indium, tin, bismuth, gallium, zinc, strontium, calcium or germanium. Preferably, the silver alloy further comprises, as a second additive element, at least one of platinum, gold, rhodium, iridium, ruthenium, palladium, lead, copper, manganese, silicon, nickel, chromium, cobalt, yttrium, iron, scandium, zirconium, titanium, niobium, molybdenum, tantalum, tungsten, hafnium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, thulium, ytterbium, magnesium and boron.

公开(公告)号：EP1712645B1

公开(公告)日：2009-05-27

申请号：EP05772607.7

申请日：2005-08-22

申请人： TANAKA KIKINZOKU KOGYO KABUSHIKI KAISHA

发明人： SHOJI, Toru, TANAKA KIKINZOKU KOGYO K.K. ,  TANAKA, Seiichiro, TANAKA KIKINZOKU KOGYO K.K. ,  TAKEISHI, Seiji, TANAKA KIKINZOKU KOGYO K.K. ,  SEGAWA, Hideo, TANAKA KIKINZOKU KOGYO K.K.

IPC分类号： C22C1/10 ,  C22C1/05 ,  B22F1/00 ,  B22F3/24 ,  C22C5/02 ,  C22C5/04 ,  C22C5/06

CPC分类号： C22C1/1084 ,  B22F1/0088 ,  B22F2998/10 ,  B22F2999/00 ,  C22C5/04 ,  C22C32/0021 ,  B22F9/082 ,  B22F9/04 ,  B22F3/10 ,  B22F3/02 ,  B22F3/17 ,  B22F3/18 ,  B22F3/24 ,  B22F2201/05 ,  B22F2201/11

摘要： A process for producing a dispersed-oxide-containing alloy in which oxide particles of one or more additive metals are dispersed in a matrix metal. The process, which is for producing a dispersed-oxide-containing alloy, comprises (a) a step in which a powder or wire of an alloy comprising a matrix metal and one or more additive metals is produced, (b) a step in which the alloy powder or wire is introduced into a high-energy ball mill together with water and the contents are agitated to thereby oxidize the additive metals contained in the alloy powder with water and form dispersed particles, and (c) a step in which the alloy powder or wire after the oxidization is shaped and solidified. It is useful especially for the production of a dispersed-oxide-containing alloy in which the free energy of oxide formation of the matrix metal is higher than the standard free energy of formation of water and the free energy of oxide formation of the additive metals is lower than the standard free energy of formation of water.

摘要翻译： 本发明提供了一种氧化物分散合金的制造方法，其中将由一种或两种或更多种添加金属的氧化物组成的分散颗粒分散在基体金属中，包括以下步骤：（a）制造合金粉末或合金 由基体金属和添加金属组成的线材; （b）用水将合金粉末中的添加剂金属氧化以形成分散的颗粒，通过将合金粉末或合金线材用水引入高能球磨机中并进行搅拌; 和（c）在氧化后使合金粉末或合金线棒固化。 本发明特别适用于制造基体金属的氧化物形成自由能高于水标准自由能的氧化物分散合金，添加金属的氧化物形成自由能低于水 标准自由能形成。

公开(公告)号：EP1507267B1

公开(公告)日：2008-11-05

申请号：EP03752892.4

申请日：2003-04-14

申请人： IDEMITSU KOSAN COMPANY LIMITED

发明人： INOUE, Kazuyoshi

IPC分类号： H01B1/02 ,  H01B5/14 ,  C22C5/06 ,  C22C9/00 ,  H01L29/786 ,  H01L21/28 ,  G02F1/1343

CPC分类号： C22C5/08 ,  C22C5/06 ,  C22C9/00 ,  C22C9/06 ,  G02F2001/136295 ,  H01B1/02 ,  H01B1/026 ,  H01L21/2855 ,  H01L21/86 ,  H01L23/49866 ,  H01L23/53247 ,  H01L29/458 ,  H01L29/4908 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

摘要： A wiring material for TFT-LCD which comprises an Ag alloy containing Ag and Zr as essential components and further one or more metals selected from the group consisting of Au, Ni, Co and Al; and a wiring material which comprises a Cu alloy comprising Au and/or Co and Cu, wherein the alloy has a Cu content of 80 to 99.5 wt % and the sum of a Au content and a Co content of 0.5 to 20 wt %. A film formed using a wiring material comprising the above alloy comprising Ag (or Cu) on a glass substrate or a silicon wafer by the sputtering method has exhibited satisfactorily low electric resistance and also satisfactorily high adhesion strength to the substrate or the wafer.

公开(公告)号：EP1770179B1

公开(公告)日：2008-09-24

申请号：EP05107053.0

申请日：2005-07-29

申请人： BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG

发明人： Strietzel, Roland

IPC分类号： C22C5/06 ,  A61K6/04

CPC分类号： A61K6/046 ,  A61K6/0205 ,  A61K6/043 ,  C22C5/02 ,  C22C5/06 ,  C22C30/00 ,  C22F1/14

公开(公告)号：EP1889931A1

公开(公告)日：2008-02-20

申请号：EP06766580.2

申请日：2006-06-12

申请人： TANAKA KIKINZOKU KOGYO KABUSHIKI KAISHA

发明人： OBATA, Tomokazu, TANAKA KIKINZOKU KOGYO K.K. ,  YANAGIHARA, Hiroshi, TANAKA KIKINZOKU KOGYO K.K

IPC分类号： C22C5/06

CPC分类号： C22C5/06 ,  B22F2998/00 ,  C22C5/08 ,  C22F1/14 ,  C23C14/185 ,  G11B7/259 ,  B22F3/10

摘要： The present invention is a silver alloy having excellent reflectance and transmittance, containing silver as a main component and as a first added element group at least one of nickel, molybdenum, copper, cobalt, titanium, scandium, yttrium, manganese, silicon, iron, zirconium, niobium, tantalum, tungsten, chromium and carbon. Here, the first added element group is preferably copper, titanium, zirconium, manganese and yttrium, and further, it is preferable to add at least one of gallium, palladium or dysprosium as a second added element group. Further, the added element concentration total is preferably 0.01 to 20.0 atom%.

摘要翻译： 本发明是以银，镍，钼，铜，钴，钛，钪，钇，锰，硅，铁，铁等至少一种元素为主要成分，含有银作为第一添加元素群组而具有优异的反射率和透射率的银合金。 锆，铌，钽，钨，铬和碳。 这里，第一添加元素组优选为铜，钛，锆，锰和钇，此外，优选添加镓，钯或镝中的至少一种作为第二添加元素组。 此外，添加元素浓度总量优选为0.01至20.0原子％。

公开(公告)号：EP1489193B1

公开(公告)日：2007-06-27

申请号：EP04011328.4

申请日：2004-05-13

申请人： W.C. Heraeus GmbH

发明人： Gehlert, Bernd ,  Specht, Heiko ,  Warkentin, Oliver, Dr.

IPC分类号： C22C5/06

CPC分类号： C22C5/06 ,  Y10T428/31678

公开(公告)号：EP1713613A1

公开(公告)日：2006-10-25

申请号：EP04819277.7

申请日：2004-11-18

申请人： Middlesex Silver Co. Limited

发明人： JOHNS, Peter, Gamon

IPC分类号： B23K35/30 ,  C22C5/06

CPC分类号： B23K35/3006 ,  C22C5/08

摘要： The present invention relates to silver solder or brazing alloys and to their use in making soldered joints in various grades of silver, particularly silversmithing grades. They alloys are of the Ag-Cu-Zn family containing at least 55 wt % Ag and from 0.5 to 3 wt% Ge. They can exhibit an advantageous combination of colour, flowability and corrosion resistance.

摘要翻译： 本发明涉及银焊料或钎焊合金，并涉及它们用于制造各种等级的银，特别是银匠级的焊接接头。 它们的合金是含有至少55重量％Ag和0.5-3重量％Ge的Ag-Cu-Zn族。 它们可以表现出颜色，流动性和耐腐蚀性的有利组合。

公开(公告)号：EP1693472A2

公开(公告)日：2006-08-23

申请号：EP06112203.2

申请日：2000-07-03

申请人： Ogasa, Kazuo

发明人： Ogasa, Kazuo

IPC分类号： C22C5/00 ,  C22C5/04 ,  C22C5/06 ,  C22F1/14

CPC分类号： C22C5/06 ,  C22C5/02 ,  C22C5/04 ,  C22C30/00 ,  C22F1/14

摘要： A hard precious metal alloy member is constituted of a gold alloy, which has a gold Au content of from 37.50 to 98.45 wt%, and contains a hardening additive in a range of not less than 50 ppm but less than 15,000 ppm, wherein the hardening additive is constituted of gadolinium Gd only, or gadolinium Gd and at least one element selected from the group consisting of rare-earth elements other than Gd, alkaline-earth elements, silicon Si, aluminum Al, and boron B.

公开(公告)号：EP1589531A3

公开(公告)日：2006-04-19

申请号：EP05008087.8

申请日：2005-04-13

申请人： KABUSHIKI KAISHA KOBE SEIKO SHO

发明人： Takagi, Katsutoshi ,  Nakai, Junichi ,  Tauchi, Yuuki

IPC分类号： G11B7/24 ,  C23C14/14 ,  C22C5/06

CPC分类号： G11B7/258 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/259 ,  Y10T428/21

摘要： The object of the present invention is to find a Ag based alloy which exhibits high cohesion resistance, high light resistance, high heat resistance, high reflectivity, high transmissivity, low absorptivity, and high thermal conductivity of the level which had not been realized by the pure Ag or by the conventional Ag alloys, and on the bases of such alloy, to provide a semi-reflective film and a reflective film for an optical information recording medium provided with excellent writing/reading properties and long term reliability; sputtering target for an optical information recording medium used in depositing such semi-reflective film and the reflective film; and an optical information recording medium provided with such semi-reflective film or the reflective film.
A semi-reflective film or reflective film for an optical information recording medium comprising a Ag based alloy, wherein the Ag based alloy comprises 0.005 to 0.40% (at% unless otherwise noted) of Bi and 0.05 to 5% in total of at least one element selected from Zn, Al, Ga, In, Si, Ge, and Sn, has been provided.

摘要翻译： 本发明的目的是找到一种Ag基合金，其具有高的内聚力，高耐光性，高耐热性，高反射率，高透射率，低吸收性和高导热性，其水平未达到 纯Ag或通过常规Ag合金，并且在这种合金的基础上，提供具有良好的书写/读取性能和长期可靠性的光学信息记录介质的半反射膜和反射膜; 用于沉积这种半反射膜和反射膜的光学信息记录介质的溅射靶; 以及设置有这种半反射膜或反射膜的光学信息记录介质。 一种用于光学信息记录介质的半反射膜或反射膜，其包括Ag基合金，其中所述Ag基合金包含Bi为0.005至0.40％（除非另有说明），为0.05至5％，总共为至少一种 已经提供了选自Zn，Al，Ga，In，Si，Ge和Sn的元素。