公开(公告)号：EP0750334B1

公开(公告)日：2006-08-09

申请号：EP96108420.9

申请日：1996-05-28

申请人： PRE-TECH CO., LTD

发明人： Netsu, Shigeyoshi ,  Miura, Shouichi ,  Harada, Yasuyuki

IPC分类号： H01L21/306 ,  H01L21/00 ,  B08B3/08

CPC分类号： H01L21/02052 ,  B08B3/12 ,  B08B7/00 ,  C02F1/36 ,  C02F1/4618 ,  C02F2001/46185 ,  C02F2201/4611 ,  C02F2201/46115 ,  C02F2201/46195 ,  H01L21/67057

公开(公告)号：EP1663534A1

公开(公告)日：2006-06-07

申请号：EP04783708.3

申请日：2004-09-10

申请人： FSI International, Inc.

发明人： CHRISTENSON, Kurt, K.

IPC分类号： B08B3/12 ,  H01L21/00 ,  B01J19/10

CPC分类号： H01L21/67057 ,  B08B3/12 ,  G10K11/20

摘要： Apparatuses and methods for processing semiconductor wafers. In one embodiment, an apparatus includes an immersion processing tank (10) in which one or more wafers (16) are positioned in a processing liquid (18) during a treatment, at least one sound source (22) that is acoustically coupled to the processing liquid (18) and that produces a sound field in the processing liquid (18) contained in the processing tank (10) during a treatment, and a sound diffusing system (28) comprising a plurality of sound diffusing elements positioned in a manner effective to diffuse sound energy transferred from the source (22) to the processing liquid (18). In another embodiment, the sound diffusing system (28) includes at least one directionally phase modulating element positioned in a manner effective to reduce interference of sound energy in the processing liquid (18). Related methods are also described.

公开(公告)号：EP1481740A3

公开(公告)日：2006-04-19

申请号：EP04011770.7

申请日：2004-05-18

申请人： DR.O.K. WACK CHEMIE GmbH

发明人： Wack, Oskar K., Dr. ,  Becht, Joachim, Dr.

IPC分类号： B08B3/14 ,  B08B3/02 ,  B08B3/04 ,  C11D7/50

CPC分类号： C11D7/5022 ,  B08B3/02 ,  B08B3/04 ,  B08B3/12 ,  B08B3/14 ,  C11D7/5031

摘要： Bei einem Flüssigreinigungsverfahren werden Gegenstände (12) zunächst mit Reinigungsflüssigkeit (18) gereinigt und dann mit Spülflüssigkeit (38) gespült. Die Reinigungsflüssigkeit (18) und die Spülflüssigkeit (38) haben zumindest annähernd die gleiche Zusammensetzung und enthalten neben Wasser eine organische Komponente derart und in einer Konzentration, dass die organische Komponente in gewissen Konzentrationen in Wasser löslich ist und die Flüssigkeit bei der bei der Reinigung herrschenden Temperatur im Zustand einer Mischungslücke mit einer wasserreichen kontinuierlichen Phase mit darin enthaltenen Tröpfchen einer organikreichen Phase vorliegt. Die die Reinigungsflüssigkeit (18) und die Spülflüssigkeit (38) bildende reinigungsaktive Flüssigkeit wird nach der Reinigung von Verschmutzungen befreit und erneut als Spülflüssigkeit bzw. Reinigungsflüssigkeit verwendet.

公开(公告)号：EP1645342A1

公开(公告)日：2006-04-12

申请号：EP05447214.7

申请日：2005-09-20

申请人： INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM vzw (IMEC) ,  SAMSUNG ELECTRONICS CO. LTD.

发明人： Holsteyns, Frank ,  Lee, Kuntack 1006 Dong 601 Ho

IPC分类号： B08B3/12 ,  B01J19/10 ,  H01L21/00

CPC分类号： B08B3/12 ,  A61L2/02 ,  B08B3/02

摘要： The invention relates to a method for creating transient cavitation comprising the steps of creating gas bubbles having a range of bubble sizes in a liquid, creating an acoustic field and subjecting the liquid to the acoustic field, characterized in that the range of bubble sizes and/or the characteristics of the acoustic field are selected to tune them to each other, thereby controlling transient cavitation in the selected range of bubble sizes. It also relates to an apparatus suitable for performing the method according to the invention.

摘要翻译： 本发明涉及一种用于产生瞬时气蚀的方法，包括以下步骤：产生具有液体中气泡尺寸范围的气泡，产生声场并使液体经受声场，其特征在于，气泡尺寸和/ 或者选择声场的特性来使它们彼此调谐，由此控制在所选择的气泡尺寸范围内的瞬时空化。 它还涉及适用于执行根据本发明的方法的装置。

公开(公告)号：EP1614001A2

公开(公告)日：2006-01-11

申请号：EP04759103.7

申请日：2004-04-02

申请人： NIKON CORPORATION

发明人： HAZELTON, Andrew, J. ,  KAWAI, Hidemi ,  WATSON, Douglas, C. ,  NOVAK, W., Thomas

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus (100) has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9-11) arranged to retain a workpiece (W), and an optical system including an illumination source and an optical element (4) opposite the workpiece (W) for having an image pattern of the reticle (R) projected by radiation from the illumination source. A gap is defined between the optical element (4) and the workpiece (W), and a fluid-supplying device (5) serves to supply an immersion liquid (7) into this gap such that the supplied immersion liquid (7) contacts both the optical element (4) and the workpiece (W) during an immersion lithography process. A cleaning device (30) is incorporated for removing absorbed liquid from the optical element (4) during a cleanup process. The cleaning device (30) may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.

摘要翻译： 浸没式光刻设备（100）具有布置成保持掩模版（R），布置成保持工件（W）的工作台（9-11）的掩模版台（RST）和包括照明源和 光学元件（4），其与工件（W）相对，用于具有通过来自照明源的辐射而突出的标线（R）的图像图案。 在光学元件（4）和工件（W）之间限定间隙，并且流体供应装置（5）用于将浸没液体（7）供应到该间隙中，使得所提供的浸液（7）接触两者 光学元件（4）和工件（W）。 一种清洁装置（30），用于在净化过程中从光学元件（4）中去除吸收的液体。 清洁装置（30）可以利用对被吸收的液体，热，真空条件，超声波振动或气蚀气泡具有亲和性的清洁液体，以除去吸收的液体。 可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。

公开(公告)号：EP1567290A2

公开(公告)日：2005-08-31

申请号：EP03789595.0

申请日：2003-11-18

申请人： Recif ,  Techsonic

发明人： CHING, Gil ,  PERRUT, Vincent ,  RUCH, Vincent ,  FRESQUET, Gilles

IPC分类号： B08B3/12

CPC分类号： B08B7/0021 ,  B08B3/12 ,  H01L21/67051 ,  H01L21/6708 ,  Y10S134/902

摘要： Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves substantially perpendicularly to the substrate. The sonic box may comprises a membrane, and a transducer coupled to the membrane.

公开(公告)号：EP1564552A1

公开(公告)日：2005-08-17

申请号：EP03811524.2

申请日：2003-11-17

申请人： Urakami, Fukashi

发明人： Urakami, Fukashi

IPC分类号： G01N29/28 ,  B08B3/12

CPC分类号： B08B3/104 ,  B08B3/12 ,  Y10S180/901 ,  Y10T74/22

摘要： This invention provides a device capable of covering the surface of an object situated in a gas with a region filled with a liquid and of moving such region, capable of sucking and collecting such liquid from the surface of the object wetted by the liquid and of drying such surface, and is capable of allowing such region to adhere to and crawl along the surface of the subject, while conducting ultrasonic flaw detection or ultrasonic cleaning of the surface of the object.
This invention provides a device comprising a stereoshaped first region having an annular surface A and a stereoshaped second region having an annular surface B wherein the surface A is the boundary surface between the surface of an object and the first region and the surface B is the boundary surface between the surface of an object and the second region, the portion defining the outer boundary of the surface A is provided with an outer seal member, the portion defining the inner boundary of the surface A is provided with an inner seal member, the first region is connected to a gas suction means, the second region is connected to a liquid supply means, the first region is located on the downstream side of the gas surrounding the device, the first region is located on the downstream side of the second region, and the liquid flowing out of the second region reaches the first region and is subsequently transported by suction to the suction means.

摘要翻译： 本发明提供一种能够覆盖位于气体中的物体的表面的装置，其中填充有液体的区域并且移动该区域，能够从被液体润湿的物体的表面吸收和收集这种液体并干燥 并且能够允许这样的区域在对象的表面进行超声波探伤或超声波清洗的同时沿着被检体的表面附着和爬行。 本发明提供了一种装置，其包括具有环形表面A的立体形状的第一区域和具有环形表面B的立体形第二区域，其中表面A是物体表面与第一区域之间的边界表面， B是物体表面与第二区域之间的边界面，限定表面A的外边界的部分设置有外密封件，限定表面A的内边界的部分设置有内密封件 第一区域连接到气体抽吸装置，第二区域连接到液体供应装置，第一区域位于围绕装置的气体的下游侧，第一区域位于下游侧 第二区域和从第二区域流出的液体到达第一区域并随后通过抽吸传送到抽吸装置。

公开(公告)号：EP1212152A4

公开(公告)日：2005-08-03

申请号：EP00930688

申请日：2000-05-12

申请人： FSI INTERNAT

发明人： PURI SURAJ ,  MEDEIROS JOSEPH JR ,  MOHINDRA RAJ

IPC分类号： B08B3/08 ,  B08B3/10 ,  B08B3/12 ,  C03C23/00 ,  C11D3/20 ,  C11D7/06 ,  C11D7/26 ,  C11D11/00 ,  C23G1/14 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306

CPC分类号： H01L21/02052 ,  B08B3/08 ,  B08B3/12 ,  C03C23/0075 ,  C11D3/2017 ,  C11D7/06 ,  C11D7/261 ,  C11D11/0047 ,  C11D11/007 ,  H01L21/67057 ,  Y10S134/902

摘要： A method of cleaning a surface of an article (106) using cleaning liquids (120) in combination with acoustic energy (126). Preferably, an ultradilute concentration of a cleaning enhancement substance, such as ammonia gas, is dissolved in a liquid solvent, such as filtered deionized water, to form a cleaning liquid. The cleaning liquid is caused to contact the surface to be cleaned. Acoustic energy is applied to the liquid during such contact. Optionally, the surface to be cleaned can be oxidized, e.g., by ozonated water, prior to cleaning.

摘要翻译： 使用与声能结合的清洁液清洁制品的表面的方法。 优选地，将诸如氨气的清洁增强物质的超稀释浓度溶解在诸如过滤的去离子水的液体溶剂中以形成清洁液体。 使清洗液与要清洁的表面接触。 在这种接触期间，声能被施加到液体。 任选地，待清洁的表面可以在清洁之前被氧化，例如通过臭氧化水。

公开(公告)号：EP1553161A1

公开(公告)日：2005-07-13

申请号：EP05003652.4

申请日：1999-02-19

申请人： THE PROCTER & GAMBLE COMPANY

发明人： Hortel, Thomas Charles ,  Senapati, Nagabhusan (NMN)

IPC分类号： C11D3/43 ,  C11D11/00 ,  C11D17/04 ,  D06B13/00

CPC分类号： B08B3/12 ,  A47L25/08 ,  C11D3/3947 ,  C11D3/43 ,  C11D11/007 ,  C11D17/041

摘要： A garment stain removal product and process is disclosed. The product includes a liquid cleaning composition which contains water, an organic solvent and a surfactant, an absorbent stain receiver, and a sonic or ultrasonic wave generating source for imparting sonic or ultrasonic waves onto stains on textiles. The sonic or ultrasonic wave source is, for example, a hand-held, pen-shaped device with a directed point to focus the sonic or ultrasonic waves at the stain to be removed.

摘要翻译： 一种衣服污渍去除产品和工艺被游离缺失盘。 该产品包括液体清洗组合物含有水与有机溶剂和表面活性剂，以吸收污渍接收机，以及用于对纺织品赋予声波或超声波走上污渍声波或超声波发生源。 声波或超声波源是，例如，具有定向点的手持式，笔形装置以聚焦的声波或超声波在污渍被除去。

公开(公告)号：EP1550518A2

公开(公告)日：2005-07-06

申请号：EP04258026.6

申请日：2004-12-22

申请人： THE BOC GROUP, INC.

发明人： Dickinson, Colin John

IPC分类号： B08B3/12 ,  B08B7/00 ,  H01L21/00

CPC分类号： H01L21/67057 ,  B08B3/12 ,  B08B7/0021

摘要： A megasonic cleaning vessel (10) for cleaning a semiconductor wafer includes a top chamber wall (11), a bottom chamber wall (12), and side walls (14) extending between the top chamber wall (11) and the bottom chamber wall (12) forming a cleaning chamber (16). A megasonic transducer (40) is provided in the cleaning chamber (16). A pedestal (20) extends upwardly from the bottom chamber wall (12) for supporting a semiconductor wafer, and an electrical conduit (24) is provided through the cleaning vessel (16) for connecting an electrical cable (25) to the megasonic transducer (40) at atmospheric pressure.

摘要翻译： 用于清洁半导体晶片的兆声波清洗容器（10）包括顶室（11），底室壁（12）和在顶室壁（11）和底室壁（11）之间延伸的侧壁 12）形成清洁室（16）。 超声波换能器（40）设置在清洁室（16）中。 基座（20）从底部室壁（12）向上延伸，用于支撑半导体晶片，并且通过清洁容器（16）提供电气导管（24），用于将电缆（25）连接到兆声换能器 40）。