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公开(公告)号：EP3418807A1
公开(公告)日：2018-12-26
申请号：EP18184704.7
申请日：2007-08-31
申请人： Nikon Corporation
发明人： Shibazaki, Yuichi
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/70775 , G03F7/7085 , G03F9/7088
摘要： During the drive of a stage (WST), positional information in a movement plane of the stage (WST) is measured by three encoders (Encl, Enc2, and Enc3) that include at least one each of an X encoder and a Y encoder of an encoder system, and a controller switches the encoders used for a measurement of positional information of the stage (WST) in the movement plane from the encoders (Encl, Enc2, and Enc3) to encoders (Enc4, Enc2, and Enc3) so that the position of the stage (WST) in the movement plane is maintained before and after the switching. Therefore, although the switching of the encoders used for controlling the position of the stage is performed, the position of the stage in the movement plane is maintained before and after the switching, and a correct linkage becomes possible.
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2.发明公开
公开(公告)号：EP3407137A1
公开(公告)日：2018-11-28
申请号：EP18163585.5
申请日：2008-01-23
申请人： Nikon Corporation
发明人： Nagasaka, Hiroyuki
CPC分类号： G03F7/70341 , G03B27/52
摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.
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公开(公告)号：EP3377942A1
公开(公告)日：2018-09-26
申请号：EP16787344.7
申请日：2016-09-30
发明人： KANEHARA, Junichi , BUTLER, Hans , DE WIT, Paul Corné Henri , VAN DER PASCH, Engelbertus Antonius Fransiscus
IPC分类号： G03F7/20
CPC分类号： G03F7/0002 , G03F7/70341 , G03F7/70733 , G03F7/70925 , G03F9/7042
摘要： A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
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4.发明授权
公开(公告)号：EP3155482B1
公开(公告)日：2018-07-04
申请号：EP15723888.2
申请日：2015-05-12
发明人： VAN BEUZEKOM, Aart, Adrianus , ALBERTI, Jozef, Augustinus, Maria , SEGERS, Hubert, Marie , VAN DER HAM, Ronald , FAHRNI, Francis , OLIESLAGERS, Ruud , PIETERSE, Gerben , ROPS, Cornelius, Maria , VAN DEN EIJNDEN, Pepijn , VAN DONGEN, Paul , WILLEMS, Bas
IPC分类号： G03F7/20
CPC分类号： G03F7/7075 , G03F7/70341 , G03F7/70991
摘要： A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.
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公开(公告)号：EP1760528B1
公开(公告)日：2018-06-06
申请号：EP06018232.6
申请日：2006-08-31
申请人： Nikon Corporation
IPC分类号： G03F7/20
CPC分类号： G03F7/70941 , G03F7/70341 , G03F7/70983
摘要： An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.
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6.发明公开
公开(公告)号：EP3323021A1
公开(公告)日：2018-05-23
申请号：EP16738442.9
申请日：2016-07-13
CPC分类号： G03F7/70341 , G02B27/0006 , G03F7/2041 , G03F7/70783 , G03F7/70808 , G03F7/70891 , G03F7/70958 , H01L21/0274
摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam through the projection system onto a target portion of a substrate. A liquid confinement structure confines an immersion liquid in a space between the projection system and the substrate. The projection system includes: an exit surface through which to project the patterned radiation beam; and a further surface facing the liquid confinement structure. The further surface has a first static receding contact angle with respect to the immersion liquid. The exit surface has a second static receding contact angle with respect to the immersion liquid. The first static receding contact angle is: greater than the second static receding contact angle; and less than 65 degrees.
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公开(公告)号：EP3293577A1
公开(公告)日：2018-03-14
申请号：EP17194348.3
申请日：2007-02-21
申请人： Nikon Corporation
发明人： Shibazaki, Yuichi
IPC分类号： G03F7/20 , H01L21/027 , G03F7/207 , G03F9/00
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/70358 , G03F7/70641 , G03F7/70666 , G03F7/70675 , G03F7/70733 , G03F7/70775 , G03F7/7085 , G03F7/70975 , G03F9/7026 , G03F9/7084 , Y10T29/49826
摘要： A partial section of an aerial image measuring unit is arranged at a wafer stage (WST) and part of the remaining section is arranged at a measurement stage (MST), and the aerial image measuring unit measures an aerial image of a mark formed by a projection optical system (PL). Therefore, for example, when the aerial image measuring unit measures a best focus position of the projection optical system (PL), the measurement can be performed using the position of the wafer stage, at which a partial section of the aerial image measuring unit is arranged, in a direction parallel to an optical axis (AX) of the projection optical system as a datum for the best focus position. Accordingly, when exposing an object (W) with illumination light (IL), the position of the wafer stage (WST) in the direction parallel to the optical axis (AX) is adjusted with high accuracy based on the measurement result of the best focus position.
摘要翻译： 空间图像测量单元的局部部分布置在晶片台（WST）处，并且其余部分的一部分布置在测量台（MST）处，并且空中图像测量单元测量由空间图像测量单元形成的标记的空中图像 投影光学系统（PL）。 因此，例如，在俯瞰图像测量单元测量投影光学系统（PL）的最佳焦点位置时，可以使用晶片平台的位置来进行测量，在该位置处，俯瞰图像测量单元的局部部分是 在平行于投影光学系统的光轴（AX）的方向上被布置为最佳聚焦位置的基准。 因此，当用照明光（IL）曝光物体（W）时，基于最佳焦点的测量结果高精度地调整晶圆载台（WST）在平行于光轴（AX）的方向上的位置 位置。
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公开(公告)号：EP3270226A1
公开(公告)日：2018-01-17
申请号：EP17186831.8
申请日：2007-02-21
申请人： Nikon Corporation
发明人： Shibazaki, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/70641 , G03F7/70666 , G03F9/7003 , G03F9/7026 , G03F9/7088 , G03F2009/005 , Y10T29/49826
摘要： While a wafer stage (WST) linearly moves in a Y-axis direction, a multipoint AF system (90a, 90b) detects surface position information of the surface of a wafer (W) at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems (AL1, AL2, to AL2 4 ) that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer (W). That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved, compared with the case where a detection operation of the marks and a detection operation of the surface position information (focus information) are independently performed.
摘要翻译： 多点AF系统（90a，90b）在晶圆载台（WST）沿Y轴方向直线移动的同时，在设定为规定的多个检测点检测晶圆（W）表面的表面位置信息 在X轴方向上的距离以及沿着X轴方向排列成一列的多个对准系统（AL1，AL2至AL24）检测晶片（W）上彼此不同的位置处的每个标记， 。 也就是说，仅仅通过晶片台（晶片）线性地通过晶片台（晶片）的阵列，在多个检测点检测晶片表面的表面位置信息和检测晶片上彼此不同的位置处的标记 与标记的检测操作和表面位置信息（焦点信息）的检测操作是相同的情况相比，多点AF系统和多个对准系统的多个检测点，并且因此可以提高吞吐量 独立执行。
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公开(公告)号：EP3267469A1
公开(公告)日：2018-01-10
申请号：EP17176350.1
申请日：2005-02-03
申请人： Nikon Corporation
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).
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10.发明授权
公开(公告)号：EP2921905B1
公开(公告)日：2017-12-27
申请号：EP15163158.7
申请日：2004-04-01
申请人： Nikon Corporation
发明人： Novak, Thomas, W.
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/7095
摘要： An exposure apparatus (10) for exposing a substrate (30) to light through an optical assembly (16) and liquid, the exposure apparatus comprising: a stage (42) for holding the substrate so that the substrate is exposed via the optical assembly and the liquid in a gap between the optical assembly and the substrate on the stage, the stage being movable relative to the optical assembly; and a liquid supply system for supplying liquid into the gap between the optical assembly and the substrate on the stage from an outlet, wherein the stage comprises: a support for supporting the substrate; and a channel for recovering the liquid supplied from the outlet and flowed outwardly from the top surface of the substrate supported by the support.
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