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    Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method
    2.
    发明公开
    Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method 审中-公开
    热调节系统用于热调节光刻设备和热调节过程的一部分

    公开(公告)号：EP2515170A3

    公开(公告)日：2017-01-18

    申请号：EP12160191.8

    申请日：2012-03-19

    Applicant: ASML Netherlands BV

    Inventor： Donders, Sjoerd ,  Banine, Vadim ,  Moors, Johannes ,  Verhagen, Martinus, Cornelis, Maria ,  Frijns, Olav, Waldemar, Vladimir ,  Van Donk, Gerrit ,  Van Gerner, Henk, Jan

    IPC: G03F7/20

    Abstract: A two-phase thermal conditioning system for thermal conditioning a part (1) of a lithographic apparatus, includes an evaporator (3) to be positioned in thermal contact with the part of the lithographic apparatus for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser (5) to be positioned at a distance from the part of the lithographic apparatus for removing heat from the fluid inside the condenser by condensation of the fluid inside the condenser; fluid lines (7,8,9) arranged between the evaporator and the condenser to form a circuit in which fluid is able to flow; a pump (14) arranged in the circuit to circulate the fluid in the circuit; an accumulator (16) configured to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger (18) to transfer heat from or to fluid inside the accumulator; a temperature sensor (23) configured to provide a measurement signal representative of the temperature of the fluid; and a controller (27) configured to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger from or to fluid inside the accumulator based on the measurement signal.

    LASER PRODUCED PLASMA EUV LIGHT SOURCE
    4.
    发明公开
    LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
    LASERERZEUGTE PLASMA-EUV-LICHTQUELLE

    公开(公告)号：EP2167193A4

    公开(公告)日：2016-01-27

    申请号：EP08794350

    申请日：2008-06-11

    Applicant: ASML NETHERLANDS BV

    Inventor： VASCHENKO GEORGIY

    IPC: A61N5/06 ,  B82Y10/00 ,  G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO2 laser, producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation. For the device, the droplet source may comprise a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing at least some adjacent droplet pairs to coalesce together prior to reaching the irradiation region. In one implementation, the disturbance may comprise a frequency modulated disturbance waveform and in another implementation, the disturbance may comprise an amplitude modulated disturbance waveform.

    Abstract translation: 公开了一种具有目标材料液滴源的等离子体产生系统，例如 锡液滴和激光，例如。 脉冲CO2激光器，产生在照射区域照射液滴的光束，产生等离子体产生EUV辐射。 对于装置，液滴源可以包括离开孔的流体和产生流体中的扰动的子系统，其产生具有不同初始速度的液滴，导致至少一些相邻液滴对在到达照射区域之前聚结在一起。 在一个实现中，扰动可以包括频率调制的干扰波形，并且在另一实现中，干扰可以包括调幅干扰波形。

    Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method
    5.
    发明公开
    Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method 审中-公开
    一种光刻设备，以从图案形成装置转移图案到衬底上，以及衰减方法

    公开(公告)号：EP2447777A3

    公开(公告)日：2015-05-27

    申请号：EP11182583.2

    申请日：2011-09-23

    Applicant: ASML Netherlands BV

    Inventor： Butler, Hans ,  Oude Nijhuis, Marco

    IPC: G03F7/20

    CPC classification number: G03F7/709 ,  G03F7/70833 ,  G03F7/7085

    Abstract: The invention relates to a lithographic apparatus including a support frame (SF) which is supported by a base (BA) via a vibration isolation system; a projection system (PS) arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame (1F) which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, including: a first sensor system (SE1) configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system (AC1) arranged to apply a force between the first frame and the support frame, and a control system (CS) configured to provide a drive signal to the first actuator system based on the first sensor output.

    Fluid handling structure and lithographic apparatus
    6.
    发明授权
    Fluid handling structure and lithographic apparatus 有权
    流体处理结构和光刻设备

    公开(公告)号：EP2381310B1

    公开(公告)日：2015-05-06

    申请号：EP11156770.7

    申请日：2011-03-03

    Applicant: ASML Netherlands BV

    Inventor： Cortie, Rogier ,  Liebregts, Paulus ,  Riepen, Michel ,  Evangelista, Fabrizio

    IPC: G03F7/20

    CPC classification number: G03F7/70341

    Abstract: A fluid handling structure (12) for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space (11) configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings (50) arranged in a first line that, in use, are directed towards a substrate (W) and/or a substrate table (WT) configured to support the substrate; a gas knife device (60) having an elongate aperture (61) in a second line; and an elongate opening or a plurality of openings (302) adjacent the gas knife device.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    7.
    发明公开
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    光刻设备和器件制造方法

    公开(公告)号：EP2534538A2

    公开(公告)日：2012-12-19

    申请号：EP11701374.8

    申请日：2011-02-02

    Applicant: ASML Netherlands BV

    Inventor： VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

    IPC: G03F7/20

    CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

    Abstract: A lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column has a self emissive contrast device (906) configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus has an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus is constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam by using a compartment (936) which provides a substantially closed environment around the moving part.

    Abstract translation: 公开了一种光刻设备，其包括能够在衬底的目标部分上形成图案的光学列。 光学柱具有被配置为发射光束的自发射对比度装置（906），以及被配置为将光束投射到目标部分上的投影系统。 该设备具有致动器，以使光学镜筒或其一部分相对于基板移动。 该装置被构造成通过使用在移动部分周围提供基本上封闭的环境的隔室（936）来减少光柱的移动部分周围的介质中的密度变化对光束的光学效应。

    Radiation source and lithographic apparatus
    8.
    发明公开
    Radiation source and lithographic apparatus 有权
    Strahlungsquelle und lithografische Vorrichtung

    公开(公告)号：EP2533078A1

    公开(公告)日：2012-12-12

    申请号：EP12158338.9

    申请日：2012-03-07

    Applicant: ASML Netherlands BV

    Inventor： Schepers, Maikel ,  Eurlings, Markus ,  Janssen, Franciscus ,  Stommen, Bernard ,  Patel, Hrishikesh ,  Kreuwel, Hermanus ,  Cohen, Jacob ,  Janssen, Pepijn ,  Boon, Maarten

    IPC: G02B5/18 ,  G02B5/08 ,  G03F7/20 ,  H05G2/00 ,  G21K1/10 ,  G21K1/06 ,  G02B27/42

    CPC classification number: G03F7/70575 ,  G03F7/70033 ,  G03F7/70891 ,  G21K1/02 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

    Abstract: A radiation source including a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and further including a collector configured to collect EUV radiation emitted by the plasma and direct it towards an intermediate focus (IF), the collector further including a diffraction grating configured to diffract infrared radiation emitted by the plasma, wherein the radiation source further ines a radiation conduit (300) located before the intermediate focus, the radiation conduit comprising an entrance aperture connected by an inwardly tapering body to an exit aperture, the radiation conduit comprising an inner portion (306) and an outer portion (308), the inner portion being closer to the intermediate focus than the outer portion, wherein the inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.

    Abstract translation: 一种辐射源，包括燃料供应，其被配置为将燃料输送到等离子体发射位置，以通过激光束来蒸发以形成等离子体，并且还包括收集器，其被配置为收集等离子体发射的EUV辐射并将其引导到中间焦点 ），所述收集器还包括被配置为衍射由所述等离子体发射的红外辐射的衍射光栅，其中所述辐射源还包括位于所述中间焦点之前的辐射导管（300），所述辐射导管包括通过向内锥形体连接的入口孔 所述辐射导管包括内部部分（306）和外部部分（308），所述内部部分比所述外部部分更接近所述中间焦点，其中所述内部部分被配置为将入射的衍射红外辐射朝向 外部。

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