DEVICE WITH CONTACTLESS HEAT TRANSFER
    2.
    发明公开

    公开(公告)号:EP4141281A1

    公开(公告)日:2023-03-01

    申请号:EP21192934.4

    申请日:2021-08-24

    申请人: MI-Partners BV

    摘要: A device 31 is provided with a housing 33 and a movable unit 35 present therein. The space 7 between the inside 33b of the housing and the outside 35b of the movable unit is filled with gas having a pressure higher than the ambient pressure. By increasing the gas pressure in the space, more heat is transferred from the movable unit to the housing via the gas. In order to maintain this higher gas pressure in this space without the movable unit coming into contact with the housing, which entails friction and thus undesirable heat development, a contactless restriction 37 is arranged between the movable unit 35 and the housing 33. This restriction 37 is formed by two closely spaced restriction surfaces 33c and 35c of the inside of the housing and the outside of the movable unit.

    SEISMIC SHAKER
    3.
    发明公开
    SEISMIC SHAKER 审中-公开
    SEISMISCHERSCHÜTTLER

    公开(公告)号:EP3004936A1

    公开(公告)日:2016-04-13

    申请号:EP14758680.4

    申请日:2014-06-04

    申请人: MI-Partners BV

    IPC分类号: G01V1/04 G01V1/155

    CPC分类号: G01V1/155 G01V1/04

    摘要: A seismic shaker (1) for exercising an excitation force on the ground (4) has a base plate (3) and a reaction mass (5) connected to the base plate via a resilient structure (7) and an actuator (9) parallel thereto. A first comparison unit (19) sends a difference signal (21) which is the difference between a displacement (27) measured by a displacement sensor (17) and a set value (25) of the displacement. A control unit (29) calculates a correction value (31) as a function of this difference signal, and sends it to a second comparison unit (33), which adds the correction value to a value of the excitation force to be exerted set in the second comparison unit (33). This second comparison unit is connected to a controller unit (15) which controls the actuator. At Low frequency this position control will track the ground force through the position set-point. The position feedback loop will be able to suppress the interfering force of the spring and any hysteresis.

    MEASURING DEVICE FOR ACCURATELY DETERMINING THE DISPLACEMENT OF A ROTATING TEST OBJECT PROVIDED WITH A LIGHT REFLECTIVE SURFACE
    6.
    发明公开
    MEASURING DEVICE FOR ACCURATELY DETERMINING THE DISPLACEMENT OF A ROTATING TEST OBJECT PROVIDED WITH A LIGHT REFLECTIVE SURFACE 审中-公开
    用于准确确定旋转测试对象位移的测量装置,该旋转测试对象具有光反射表面

    公开(公告)号:EP3267145A1

    公开(公告)日:2018-01-10

    申请号:EP16192490.7

    申请日:2016-10-05

    申请人: MI-Partners BV

    IPC分类号: G01B9/02

    CPC分类号: G01B9/02061

    摘要: A measuring device of the interferometer type has an optical system 2, as well as a light source 1 and a sensor 3. The optical system has a beam splitter 4 and a reflector 9 which is under 45° with respect to light-splitting surface 5 of the beam splitter. The measuring object 21 is present in line with the beam of light emitted by the light source 6 and is located at the rear side of the beam splitter. The measuring device further comprises a further optical system 13, which is such that a reflected from the light reflecting surface 21A of the object to be measured, and in the further optical system incoming light beam in the same direction and at the same site as that in which it entered, is sent back. This may also be the case of relatively large skewness of the measurement object 21, the object of the measurement reflected light beam in itself will be sent back.

    摘要翻译: 干涉仪类型的测量装置具有光学系统2以及光源1和传感器3.光学系统具有分束器4和相对于分光表面5成45°的反射器9 的分束器。 测量对象21与光源6发出的光束一致并位于分束器的后侧。 测量装置进一步包括另外的光学系统13,该另外的光学系统13使得从被测量物体的光反射表面21A反射,并且在另一光学系统中以相同的方向并且在相同的位置处 在它进入,被送回。 这也可能是测量对象21相对较大偏斜的情况,测量反射光束本身的对象将被发回。

    Device for positioning a waferchuck
    7.
    发明公开
    Device for positioning a waferchuck 有权
    Vorrichtung zur Positionierung einerTrägerplatte

    公开(公告)号:EP2672321A1

    公开(公告)日:2013-12-11

    申请号:EP13170539.4

    申请日:2013-06-04

    申请人: MI-Partners BV

    IPC分类号: G03F7/20

    CPC分类号: G03F7/70758

    摘要: A positioning device (1) for a wafer chuck (13) comprises a housing (9) in which underpressure prevails, as well as the wafer chuck displaceable over the bottom (7) of the housing, and positioining means (17) located underneath the bottom for positioning the wafer chuck.
    The positioning means comprises eight actuators four of which form vertical actuators (23) which each have a disc-shaped round permanent magnet (25), as well as a coil (27) partly situated around it and partly above it, the bottom (27A) of which coil is present at a level in between the bottom (25A) and top (25B) of the disc-shaped magnet and whose inner diameter (D1) is larger than the outer diameter (D2) of the disc-shaped magnet.
    The wafer chuck accommodates an annular permanent magnet (29) above the coil, which magnet has an opening in the middle. The magnets (25, 29) are vertically polarized while the polarization of the one magnet is opposite to that of the other.

    摘要翻译: 用于晶片卡盘(13)的定位装置(1)包括其中存在负压的壳体(9)以及可移动到壳体的底部(7)上的晶片卡盘以及位于所述壳体下方的位置装置(17) 底部用于定位晶片卡盘。 定位装置包括八个致动器,其中四个形成垂直致动器(23),每个驱动器具有圆盘状的永久永磁体(25),以及部分位于其周围并部分地位于其上方的线圈(27A),底部 ),其盘管位于盘状磁体的底部(25A)和顶部(25B)之间,其内径(D1)大于盘状磁体的外径(D2)的水平面上。 晶片卡盘容纳线圈上方的环形永磁体(29),该磁体在中间具有开口。 磁体(25,29)是垂直极化的,而一个磁体的极化与另一个磁体的极化相反。