公开(公告)号：EP2215282A4

公开(公告)日：2010-11-17

申请号：EP08837292

申请日：2008-10-09

申请人： VALENCE PROCESS EQUIPMENT INC

发明人： BEGARNEY MICHAEL J ,  CAMPANALE FRANK J

IPC分类号： C23C16/00

CPC分类号： H01L21/67017 ,  C23C16/45508 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/4581 ,  C23C16/4584 ,  Y10T137/9247

公开(公告)号：EP2215282A2

公开(公告)日：2010-08-11

申请号：EP08837292.5

申请日：2008-10-09

申请人： Valence Process Equipment, Inc.

发明人： BEGARNEY, Michael, J. ,  CAMPANALE, Frank, J.

IPC分类号： C23C16/00

CPC分类号： H01L21/67017 ,  C23C16/45508 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/4581 ,  C23C16/4584 ,  Y10T137/9247

摘要： A CVD reactor, such as a MOCVD reactor conducting metalorganic chemical vapor deposition of epitaxial layers, is provided. The CVD or MOCVD reactor generally comprises a flow flange assembly, adjustable proportional flow injector assembly, a chamber assembly, and a multi-segment center rotation shaft. The reactor provides a novel geometry to specific components that function to reduce the gas usage while also improving the performance of the deposition.

公开(公告)号：EP2215282B1

公开(公告)日：2016-11-30

申请号：EP08837292.5

申请日：2008-10-09

申请人： Valence Process Equipment, Inc.

发明人： BEGARNEY, Michael, J. ,  CAMPANALE, Frank, J.

IPC分类号： C23C16/00 ,  C23C16/455 ,  C23C16/458

CPC分类号： H01L21/67017 ,  C23C16/45508 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/4581 ,  C23C16/4584 ,  Y10T137/9247