MICROFABRICATION USING REPLCIATED PATTERNED TOPOGRAPHY AND SELF-ASSEMBLED MONOLAYERS
    1.
    发明公开
    MICROFABRICATION USING REPLCIATED PATTERNED TOPOGRAPHY AND SELF-ASSEMBLED MONOLAYERS 审中-公开
    MICRO制备结构化复制的地形和自行安排的MONO层的基

    公开(公告)号:EP1922436A2

    公开(公告)日:2008-05-21

    申请号:EP06800582.6

    申请日:2006-07-31

    IPC分类号: C23C28/00 C23C18/16

    摘要: A method of selectively and electrolessly depositing a metal onto a substrate having a metallic patterned-nanostructure surface is disclosed. The method includes providing a tool having a patterned-nanostructure surface, the patterned-nanostructure surface having surface regions having a nanostructured surface, replicating the tool patterned-nanostructure surface onto a substrate to form a substrate patterned-nanostructure surface, disposing a metal layer on the substrate patterned-nanostructure surface to form a metallic patterned-nanostructure surface region, forming a self-assembled monolayer on the metallic patterned-nanostructure surface region, exposing the self-assembled monolayer to an electroless plating solution comprising a deposit metal, and depositing electrolessly the deposit metal selectively on the surface regions having a metallic nanostructured surface. Articles formed from this method are also disclosed.