公开(公告)号：EP1700333A4

公开(公告)日：2008-08-06

申请号：EP04808517

申请日：2004-12-21

申请人： ADAPTIVE PLASMA TECH CORP

发明人： SONG YEONG SU ,  OH SANG RYONG ,  KIM S K ,  KIM N H

IPC分类号： H01L21/3065 ,  G01N21/68 ,  H01L21/311 ,  H01L21/66

CPC分类号： G01N21/68 ,  H01L21/31116 ,  H01L22/26

摘要： A plasma equipment seasoning method and plasma equipment to which the seasoning method is applied. The seasoning method comprising the steps of measuring the ratio of optical emission intensity of silicon oxide (SiOx)-based chemical species to optical emission intensity of carbon fluoride compound (CFY)-­based chemical species present in a process chamber of plasma equipment before operating the plasma equipment to perform a plasma process, determining whether the value of the measured optical emission intensity ratio is within a predetermined range of normal state or not, and, when reaction gas to be used in the plasma process is supplied into the process chamber based on the result of determination such that the value of the measured optical emission intensity ratio is within the predetermined range of normal state, seasoning the interior of the process chamber to change the ratio of components of the reaction gas, and thus, to change the optical emission intensity ratio.