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    LIGHT STABILIZER COMPOSITION AND RESIN COMPOSITION CONTAINING SAME
    1.
    发明公开
    LIGHT STABILIZER COMPOSITION AND RESIN COMPOSITION CONTAINING SAME 有权
    哈萨克斯坦民族文化遗产保护协会（LICHTSTABILISATORZUSAMMENSETZZZZ）

    公开(公告)号：EP3075815A1

    公开(公告)日：2016-10-05

    申请号：EP14865751.3

    申请日：2014-11-10

    申请人： Adeka Corporation

    发明人： AYABE, Takashi ,  USUI, Takashi ,  YOKOMORI, Minako

    IPC分类号： C09K15/20 ,  C08K9/12 ,  C08L23/00 ,  C08L101/00 ,  C09K3/00

    CPC分类号： C08K5/005 ,  C08K3/34 ,  C08K3/36 ,  C08K5/134 ,  C08K5/3435 ,  C08K9/12 ,  C08L23/12 ,  C08L23/16 ,  C08L101/00

    摘要： A light stabilizer composition containing a hindered amine compound obtained by the reaction between a 2,2,6,6-tetramethylpiperidinol and a carbonic ester and having improved handling properties. The composition contains (A) 100 parts by mass of silica having a water content of 2 to 7 wt% impregnated with (B) 10 to 300 parts by mass of a hindered amine compound represented by general formula (1). The composition preferably contains (C) 5 to 500 parts by mass of a benzotriazole light stabilizer represented by general formula (3). The symbols used in formulae (1) and (3) are as defined in the description.

    摘要翻译： 含有通过2,2,6,6-四甲基哌啶醇与碳酸酯反应得到的具有改进的处理性能的受阻胺化合物的光稳定剂组合物。 该组合物含有（A）100质量份用（B）含水2〜7重量％的二氧化硅，10〜300质量份的通式（1）表示的受阻胺化合物。 该组合物优选含有（C）5〜500质量份的由通式（3）表示的苯并三唑光稳定剂。 式（1）和（3）中使用的符号如说明书中所定义。

    RESIN COMPOSITION
    2.
    发明公开
    RESIN COMPOSITION 审中-公开

    公开(公告)号：EP3789455A1

    公开(公告)日：2021-03-10

    申请号：EP20200569.0

    申请日：2017-04-27

    申请人： ADEKA CORPORATION

    发明人： AKATSU, Hiroki ,  AYABE, Takashi

    IPC分类号： C08L77/00 ,  B29C45/00 ,  C08K5/3492 ,  C08L67/04 ,  C08L81/02 ,  C08L101/16

    摘要： A resin composition comprising: (A) 100 parts by mass of a resin selected from the group consisting of polyamide, polylactic acid, and polyphenylene sulfide each having a melting point of 170°C to 370°C; (B) 0.05 to 5.0 parts by mass of a triazine compound represented by general formula (1); (C) 0 to 3.0 parts by mass of a specific oxidizing agent; and (D) 0 to 1.0 part by mass of a specific light stabilizer. Details of components (B), (C), and (D) are as described in the description.

    RESIN COMPOSITION
    4.
    发明公开
    RESIN COMPOSITION 审中-公开

    公开(公告)号：EP3470465A1

    公开(公告)日：2019-04-17

    申请号：EP17809998.2

    申请日：2017-04-27

    申请人： Adeka Corporation

    发明人： AKATSU, Hiroki ,  AYABE, Takashi

    IPC分类号： C08L77/00 ,  B29C45/00 ,  C08K5/3492 ,  C08L67/04 ,  C08L81/02 ,  C08L101/16

    摘要： A resin composition comprising: (A) 100 parts by mass of a resin selected from the group consisting of polyamide, polylactic acid, and polyphenylene sulfide each having a melting point of 170°C to 370°C; (B) 0.05 to 5.0 parts by mass of a triazine compound represented by general formula (1); (C) 0 to 3.0 parts by mass of a specific oxidizing agent; and (D) 0 to 1.0 part by mass of a specific light stabilizer. Details of components (B), (C), and (D) are as described in the description.

    PHOTOSTABILIZER MASTER BATCH AND METHOD FOR MANUFACTURING SAME
    5.
    发明公开
    PHOTOSTABILIZER MASTER BATCH AND METHOD FOR MANUFACTURING SAME 审中-公开
    照相调节器主分批及其制造方法

    公开(公告)号：EP3279240A1

    公开(公告)日：2018-02-07

    申请号：EP16772984.7

    申请日：2016-03-30

    申请人： Adeka Corporation

    发明人： AYABE, Takashi ,  USUI, Takashi

    IPC分类号： C08J3/22 ,  C08K3/36 ,  C08K5/17 ,  C08L23/00 ,  C08L101/00

    摘要： Provided are: a photostabilizer masterbatch in which the problems of the occurrence of blocking over time due to the effect of temperature fluctuations in the environment and the difficulty in handling due to the resulting solidification in aggregates are overcome; and a method of producing the same.
    The photostabilizer masterbatch is obtained by adding and mixing 80 to 300 parts by mass of (B) a hindered amine compound represented by the following Formula (1) with respect to 100 parts by mass of (A) a silica produced by a wet process and subsequently further adding and mixing 5 to 50 parts by mass of (C) a silica produced by a dry process:

    (wherein, R 1 represents a hydrogen atom, a hydroxy group, an alkyl, hydroxyalkyl, alkoxy or hydroxyalkoxy group having 1 to 30 carbon atoms, or an oxy radical; and R 2 represents an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or a group represented by the following Formula (2))

    (wherein, R 3 represents the same as R 1 in the Formula (1)).

    摘要翻译： 本发明提供一种光稳定化母料，该光稳定化母料克服了由于环境温度波动的影响而导致的经时堵塞的发生以及由于凝聚体中的固化而难以处理的问题， 及其制造方法。 （B）由下式（1）表示的受阻胺化合物相对于（A）通过湿法制造的二氧化硅100质量份和（B）100质量份添加混合80质量份至300质量份的光稳定化母料， （C）通过干法制造的二氧化硅（其中，R 1表示碳原子数1〜30的氢原子，羟基，烷基，羟基烷基，烷氧基或羟基烷氧基）5〜50质量份 原子或氧基;并且R 2表示具有1至30个碳原子的烷基，具有2至30个碳原子的烯基或由下式（2）表示的基团）（其中，R 3表示与 式（1）中的R1）。

    POLYMER MATERIAL COMPOSITION
    6.
    发明公开
    POLYMER MATERIAL COMPOSITION 审中-公开
    POLYMERMATERIALZUSAMMENSETZUNG

    公开(公告)号：EP2006324A9

    公开(公告)日：2009-07-22

    申请号：EP07739754.5

    申请日：2007-03-27

    申请人： Adeka Corporation

    发明人： NEGISHI, Yoshinori ,  AYABE, Takashi ,  SUZUKI, Masato ,  TOBITA, Etsuo

    IPC分类号： C08K5/3492 ,  C07D251/24 ,  C08L69/00 ,  C08L101/00

    CPC分类号： C08J5/18 ,  C07D251/24 ,  C08J2369/00 ,  C08K5/3492 ,  C08L69/00

    摘要： [Object] To provide a polymeric material composition having high heat resistance, excellent compatibility, and greatly improved weatherability.
    [Solving Means] A polymeric material composition containing:
    a polymeric material and a triazine compound having the general formula (I):

    wherein R 1 to R 3 denote an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an alkylaryl group, or an arylalkyl group, these groups being optionally substituted by a hydroxy group, a halogen atom, a cyano group, a nitro group, an alkyl group, or an alkoxy group, and/or being optionally interrupted by an oxygen atom, a sulfur atom, a carbonyl group, an ester group, an amide group, or an imino group; R 4 to R 6 denote an alkyl group or an alkenyl group; and R 7 to R 9 denote a hydrogen atom, a halogen atom, an alkyl group, or an alkenyl group.

    POLYMER MATERIAL COMPOSITION
    9.
    发明公开
    POLYMER MATERIAL COMPOSITION 审中-公开
    POLYMERMATERIALZUSAMMENSETZUNG

    公开(公告)号：EP2006324A2

    公开(公告)日：2008-12-24

    申请号：EP07739754.5

    申请日：2007-03-27

    申请人： Adeka Corporation

    发明人： NEGISHI, Yoshinori ,  AYABE, Takashi ,  SUZUKI, Masato ,  TOBITA, Etsuo

    IPC分类号： C08K5/3492 ,  C07D251/24 ,  C08L69/00 ,  C08L101/00

    CPC分类号： C08J5/18 ,  C07D251/24 ,  C08J2369/00 ,  C08K5/3492 ,  C08L69/00

    摘要： [Object] To provide a polymeric material composition having high heat resistance, excellent compatibility, and greatly improved weatherability.
    [Solving Means] A polymeric material composition containing:
    a polymeric material and a triazine compound having the general formula (I):

    wherein R 1 to R 3 denote an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an alkylaryl group, or an arylalkyl group, these groups being optionally substituted by a hydroxy group, a halogen atom, a cyano group, a nitro group, an alkyl group, or an alkoxy group, and/or being optionally interrupted by an oxygen atom, a sulfur atom, a carbonyl group, an ester group, an amide group, or an imino group; R 4 to R 6 denote an alkyl group or an alkenyl group; and R 7 to R 9 denote a hydrogen atom, a halogen atom, an alkyl group, or an alkenyl group.

    摘要翻译： 提供具有高耐热性，优异的相容性和大大改善的耐候性的聚合物材料组合物。 [解决方案]一种聚合物材料组合物，其包含：具有通式（I）的聚合物材料和三嗪化合物：其中R 1至R 3表示烷基，环烷基，烯基，芳基，烷基芳基 基团或芳基烷基，这些基团任选被羟基，卤素原子，氰基，硝基，烷基或烷氧基取代，和/或任选被氧原子中断， 硫原子，羰基，酯基，酰胺基或亚氨基; R 4〜R 6表示烷基或烯基; R 7〜R 9表示氢原子，卤素原子，烷基或烯基。