公开(公告)号：EP1369250A3

公开(公告)日：2004-01-02

申请号：EP03100930.1

申请日：2003-04-07

申请人： Agfa Corporation

发明人： Comeau, Bryan ,  Bailey, Dwayne ,  Allen, Roy ,  Romano, David

IPC分类号： G03F7/20 ,  B41J2/447

CPC分类号： B41J2/47

摘要： A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum (110) and a carriage (120), including a light source (122) and a spatial light modulator (130) for selectively exposing the media (12) that is held against the drum (110). The invention can be applied to internal or external drum (110) systems. The calibration system comprises a calibration sensor (150) that is scanned relative to the spatial light modulator (130). The controller (131) then analyzes the response of the calibration sensor (150) to generate calibration information that is used to configure the spatial light modulator (130). The use of this calibration sensor (150) allows for job-to-job calibration of the spatial light modulator (130), in one example, that ensures the generation of a high quality images, without banding, for example, on the media (12). This calibration system is also used to detect a best focus position for projection optics (128) by measuring a contrast ratio between exposure (912) and OFF light (910) levels for various focus settings. It selects the best focus position in response to the contrast ratio.

公开(公告)号：EP1353231A3

公开(公告)日：2005-10-19

申请号：EP03100928.5

申请日：2003-04-07

申请人： AGFA CORPORATION

发明人： Comeau, Bryan ,  Bailey, Dwayne ,  Allen, Roy ,  Romano, David

IPC分类号： G03F7/20 ,  B41J2/465

CPC分类号： B41J2/465

摘要： A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum (110) and a carriage (120), including a light source (122) and a spatial light modulator (130) for selectively exposing the media (12) that is held against the drum (110). The invention can be applied to internal or external drum systems. The calibration system comprises a calibration sensor (150) that is scanned relative to the spatial light modulator (130). The controller (131) then analyzes the response of the calibration sensor (150) to generate calibration information that is used to configure the spatial light modulator (130). The use of this calibration sensor allows for job-to-job calibration of the spatial light modulator (130), in one example, that ensures the generation of a high quality images, without banding, for example, on the media. This calibration system is also used to detect a best focus position for projection optics by measuring a contrast ratio between exposure (912) and dark levels (910) for various focus settings. It selects the best focus position in response to the contrast ratio (912/910).

公开(公告)号：EP1637929A1

公开(公告)日：2006-03-22

申请号：EP04104454.6

申请日：2004-09-15

申请人： AGFA CORPORATION

发明人： Romano, David ,  Hebert, James ,  Frances, James ,  Bussard, Mark

IPC分类号： G03F7/20 ,  H04N1/407 ,  B41J2/47

CPC分类号： G03F7/2055

摘要： A method for characterizing exposure levels in a platesetter comprises exposing regions of a plate at different exposure levels by modulating the power of an exposure beam and then analyzing the plate after development to determine a desired exposure level for plates on the platesetter by reference to the regions receiving the different exposure levels. The plates are preferably exposed in an area outside of a printing area. In this way, the exposure test can be performed as part of the normal plate printing process. The plate is not consumed. Moreover, the plate exposure setting can be constantly monitored throughout production in one implementation.

摘要翻译： 用于表征制版机中的曝光水平的方法包括通过调制曝光光束的光焦度曝光不同曝光水平的板的区域，然后在显影之后分析板以通过参考区域来确定印版机板上所需的曝光水平 接收不同的曝光水平。 板优选地在印刷区域外部的区域中暴露。 以这种方式，曝光测试可以作为普通印版印刷过程的一部分进行。 板没有消耗。 此外，在一个实施中，可以在整个生产过程中不断监测印版曝光设置。

公开(公告)号：EP1369250A2

公开(公告)日：2003-12-10

申请号：EP03100930.1

申请日：2003-04-07

申请人： Agfa Corporation

发明人： Comeau, Bryan ,  Bailey, Dwayne ,  Allen, Roy ,  Romano, David

IPC分类号： B41J2/44 ,  G06K15/00 ,  H04N1/00

CPC分类号： B41J2/47

摘要： A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum (110) and a carriage (120), including a light source (122) and a spatial light modulator (130) for selectively exposing the media (12) that is held against the drum (110). The invention can be applied to internal or external drum (110) systems. The calibration system comprises a calibration sensor (150) that is scanned relative to the spatial light modulator (130). The controller (131) then analyzes the response of the calibration sensor (150) to generate calibration information that is used to configure the spatial light modulator (130). The use of this calibration sensor (150) allows for job-to-job calibration of the spatial light modulator (130), in one example, that ensures the generation of a high quality images, without banding, for example, on the media (12). This calibration system is also used to detect a best focus position for projection optics (128) by measuring a contrast ratio between exposure (912) and OFF light (910) levels for various focus settings. It selects the best focus position in response to the contrast ratio.

摘要翻译： 用于制版机或成像机的校准系统适用于具有介质鼓（110）和滑架（120）的系统，该系统包括用于选择性地使介质（12）暴露的光源（122）和空间光调制器（130） 其被固定在滚筒（110）上。 本发明可以应用于内部或外部鼓（110）系统。 校准系统包括相对于空间光调制器（130）扫描的校准传感器（150）。 控制器（131）然后分析校准传感器（150）的响应以产生用于配置空间光调制器（130）的校准信息。 在一个示例中，使用该校准传感器（150）允许空间光调制器（130）的作业到作业校准，其确保高质量图像的产生，而不需要例如在介质上（例如， 12）。 该校准系统还用于通过测量用于各种聚焦设置的曝光（912）和OFF光（910）水平之间的对比度比来检测用于投影光学元件（128）的最佳聚焦位置。 它响应于对比度选择最佳对焦位置。 用于制版机或成像机的校准系统适用于具有介质鼓（110）和托架（120）的系统，所述介质鼓（110）和托架（120）包括用于选择性地曝光介质的光源（122）和空间光调制器（130） （12），其抵靠所述滚筒（110）。 本发明可以应用于内部或外部鼓（110）系统。 校准系统包括相对于空间光调制器（130）扫描的校准传感器（150）。 控制器（131）然后分析校准传感器（150）的响应以产生用于配置空间光调制器（130）的校准信息。 在一个示例中，使用该校准传感器（150）允许空间光调制器（130）的作业到作业校准，其确保高质量图像的产生，而不需要例如在介质上（例如， 12）。 该校准系统还用于通过测量用于各种聚焦设置的曝光（912）和OFF光（910）水平之间的对比度比来检测用于投影光学元件（128）的最佳聚焦位置。 它响应于对比度选择最佳对焦位置。

公开(公告)号：EP1353231A2

公开(公告)日：2003-10-15

申请号：EP03100928.5

申请日：2003-04-07

申请人： Agfa Corporation

发明人： Comeau, Bryan ,  Bailey, Dwayne ,  Allen, Roy ,  Romano, David

IPC分类号： G03F7/20

CPC分类号： B41J2/465

摘要： A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum (110) and a carriage (120), including a light source (122) and a spatial light modulator (130) for selectively exposing the media (12) that is held against the drum (110). The invention can be applied to internal or external drum systems. The calibration system comprises a calibration sensor (150) that is scanned relative to the spatial light modulator (130). The controller (131) then analyzes the response of the calibration sensor (150) to generate calibration information that is used to configure the spatial light modulator (130). The use of this calibration sensor allows for job-to-job calibration of the spatial light modulator (130), in one example, that ensures the generation of a high quality images, without banding, for example, on the media. This calibration system is also used to detect a best focus position for projection optics by measuring a contrast ratio between exposure (912) and dark levels (910) for various focus settings. It selects the best focus position in response to the contrast ratio (912/910).

摘要翻译： 用于制版机或成像机的校准系统适用于具有介质鼓（110）和滑架（120）的系统，该系统包括用于选择性地使介质（12）暴露的光源（122）和空间光调制器（130） 其被固定在滚筒（110）上。 本发明可应用于内部或外部鼓系统。 校准系统包括相对于空间光调制器（130）扫描的校准传感器（150）。 控制器（131）然后分析校准传感器（150）的响应以产生用于配置空间光调制器（130）的校准信息。 在一个示例中，使用该校准传感器允许空间光调制器（130）的作业到作业校准，其确保例如在介质上无条带地产生高质量图像。 该校准系统还用于通过测量各种聚焦设置的曝光（912）和暗度（910）之间的对比度来检测投影光学元件的最佳聚焦位置。 它响应于对比度（912/910）选择最佳对焦位置。