公开(公告)号：EP1369250A3

公开(公告)日：2004-01-02

申请号：EP03100930.1

申请日：2003-04-07

申请人： Agfa Corporation

发明人： Comeau, Bryan ,  Bailey, Dwayne ,  Allen, Roy ,  Romano, David

IPC分类号： G03F7/20 ,  B41J2/447

CPC分类号： B41J2/47

摘要： A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum (110) and a carriage (120), including a light source (122) and a spatial light modulator (130) for selectively exposing the media (12) that is held against the drum (110). The invention can be applied to internal or external drum (110) systems. The calibration system comprises a calibration sensor (150) that is scanned relative to the spatial light modulator (130). The controller (131) then analyzes the response of the calibration sensor (150) to generate calibration information that is used to configure the spatial light modulator (130). The use of this calibration sensor (150) allows for job-to-job calibration of the spatial light modulator (130), in one example, that ensures the generation of a high quality images, without banding, for example, on the media (12). This calibration system is also used to detect a best focus position for projection optics (128) by measuring a contrast ratio between exposure (912) and OFF light (910) levels for various focus settings. It selects the best focus position in response to the contrast ratio.

公开(公告)号：EP1353231A3

公开(公告)日：2005-10-19

申请号：EP03100928.5

申请日：2003-04-07

申请人： AGFA CORPORATION

发明人： Comeau, Bryan ,  Bailey, Dwayne ,  Allen, Roy ,  Romano, David

IPC分类号： G03F7/20 ,  B41J2/465

CPC分类号： B41J2/465

摘要： A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum (110) and a carriage (120), including a light source (122) and a spatial light modulator (130) for selectively exposing the media (12) that is held against the drum (110). The invention can be applied to internal or external drum systems. The calibration system comprises a calibration sensor (150) that is scanned relative to the spatial light modulator (130). The controller (131) then analyzes the response of the calibration sensor (150) to generate calibration information that is used to configure the spatial light modulator (130). The use of this calibration sensor allows for job-to-job calibration of the spatial light modulator (130), in one example, that ensures the generation of a high quality images, without banding, for example, on the media. This calibration system is also used to detect a best focus position for projection optics by measuring a contrast ratio between exposure (912) and dark levels (910) for various focus settings. It selects the best focus position in response to the contrast ratio (912/910).

公开(公告)号：EP0856402B1

公开(公告)日：2003-07-16

申请号：EP98200153.9

申请日：1998-01-21

申请人： Agfa Corporation

发明人： Allen, Roy

IPC分类号： B41F33/00

CPC分类号： B41F33/0081 ,  B41P2233/52

公开(公告)号：EP1369250A2

公开(公告)日：2003-12-10

申请号：EP03100930.1

申请日：2003-04-07

申请人： Agfa Corporation

发明人： Comeau, Bryan ,  Bailey, Dwayne ,  Allen, Roy ,  Romano, David

IPC分类号： B41J2/44 ,  G06K15/00 ,  H04N1/00

CPC分类号： B41J2/47

摘要： A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum (110) and a carriage (120), including a light source (122) and a spatial light modulator (130) for selectively exposing the media (12) that is held against the drum (110). The invention can be applied to internal or external drum (110) systems. The calibration system comprises a calibration sensor (150) that is scanned relative to the spatial light modulator (130). The controller (131) then analyzes the response of the calibration sensor (150) to generate calibration information that is used to configure the spatial light modulator (130). The use of this calibration sensor (150) allows for job-to-job calibration of the spatial light modulator (130), in one example, that ensures the generation of a high quality images, without banding, for example, on the media (12). This calibration system is also used to detect a best focus position for projection optics (128) by measuring a contrast ratio between exposure (912) and OFF light (910) levels for various focus settings. It selects the best focus position in response to the contrast ratio.

摘要翻译： 用于制版机或成像机的校准系统适用于具有介质鼓（110）和滑架（120）的系统，该系统包括用于选择性地使介质（12）暴露的光源（122）和空间光调制器（130） 其被固定在滚筒（110）上。 本发明可以应用于内部或外部鼓（110）系统。 校准系统包括相对于空间光调制器（130）扫描的校准传感器（150）。 控制器（131）然后分析校准传感器（150）的响应以产生用于配置空间光调制器（130）的校准信息。 在一个示例中，使用该校准传感器（150）允许空间光调制器（130）的作业到作业校准，其确保高质量图像的产生，而不需要例如在介质上（例如， 12）。 该校准系统还用于通过测量用于各种聚焦设置的曝光（912）和OFF光（910）水平之间的对比度比来检测用于投影光学元件（128）的最佳聚焦位置。 它响应于对比度选择最佳对焦位置。 用于制版机或成像机的校准系统适用于具有介质鼓（110）和托架（120）的系统，所述介质鼓（110）和托架（120）包括用于选择性地曝光介质的光源（122）和空间光调制器（130） （12），其抵靠所述滚筒（110）。 本发明可以应用于内部或外部鼓（110）系统。 校准系统包括相对于空间光调制器（130）扫描的校准传感器（150）。 控制器（131）然后分析校准传感器（150）的响应以产生用于配置空间光调制器（130）的校准信息。 在一个示例中，使用该校准传感器（150）允许空间光调制器（130）的作业到作业校准，其确保高质量图像的产生，而不需要例如在介质上（例如， 12）。 该校准系统还用于通过测量用于各种聚焦设置的曝光（912）和OFF光（910）水平之间的对比度比来检测用于投影光学元件（128）的最佳聚焦位置。 它响应于对比度选择最佳对焦位置。

公开(公告)号：EP1353231A2

公开(公告)日：2003-10-15

申请号：EP03100928.5

申请日：2003-04-07

申请人： Agfa Corporation

发明人： Comeau, Bryan ,  Bailey, Dwayne ,  Allen, Roy ,  Romano, David

IPC分类号： G03F7/20

CPC分类号： B41J2/465

摘要： A calibration system for a platesetter or imagesetter is applicable to systems that have a media drum (110) and a carriage (120), including a light source (122) and a spatial light modulator (130) for selectively exposing the media (12) that is held against the drum (110). The invention can be applied to internal or external drum systems. The calibration system comprises a calibration sensor (150) that is scanned relative to the spatial light modulator (130). The controller (131) then analyzes the response of the calibration sensor (150) to generate calibration information that is used to configure the spatial light modulator (130). The use of this calibration sensor allows for job-to-job calibration of the spatial light modulator (130), in one example, that ensures the generation of a high quality images, without banding, for example, on the media. This calibration system is also used to detect a best focus position for projection optics by measuring a contrast ratio between exposure (912) and dark levels (910) for various focus settings. It selects the best focus position in response to the contrast ratio (912/910).

摘要翻译： 用于制版机或成像机的校准系统适用于具有介质鼓（110）和滑架（120）的系统，该系统包括用于选择性地使介质（12）暴露的光源（122）和空间光调制器（130） 其被固定在滚筒（110）上。 本发明可应用于内部或外部鼓系统。 校准系统包括相对于空间光调制器（130）扫描的校准传感器（150）。 控制器（131）然后分析校准传感器（150）的响应以产生用于配置空间光调制器（130）的校准信息。 在一个示例中，使用该校准传感器允许空间光调制器（130）的作业到作业校准，其确保例如在介质上无条带地产生高质量图像。 该校准系统还用于通过测量各种聚焦设置的曝光（912）和暗度（910）之间的对比度来检测投影光学元件的最佳聚焦位置。 它响应于对比度（912/910）选择最佳对焦位置。

公开(公告)号：EP1351097A2

公开(公告)日：2003-10-08

申请号：EP03100927.7

申请日：2003-04-07

申请人： Agfa Corporation

发明人： Allen, Roy ,  Kiermeier, Arnfried ,  Nolan, John

IPC分类号： G03F9/00

CPC分类号： H04N1/00015 ,  H04N1/00002 ,  H04N1/00031 ,  H04N1/00045 ,  H04N1/00058 ,  H04N1/00087 ,  H04N1/12 ,  H04N1/19

摘要： A calibration system is disclosed for use with an imaging system including a laser line illumination source (10). The calibration system includes an imaging head (16), a mask (24) having a calibration opening (26) through which a portion of the line of laser illumination (10) may pass, and a calibration unit (20). The imaging head (16) is movable along a slow scan direction with respect to an imaging surface (18) for imaging a line of laser illumination (22) in the slow scan direction. The calibration opening (26) has a width in the slow scan direction that is larger than a full width half maximum distance of an imaging spot of a smallest addressable picture element of the line of laser illumination (22). The calibration unit (20) is for receiving a portion of the line of laser illumination (22) through the calibration opening (26) and for processing the received portion of the line of laser illumination (22).

摘要翻译： 校准系统是游离缺失盘用于与成像系统，包括激光线照射源（10）的使用。 所述校准系统包括：在成像头（16），具有一校准孔（26），通过该激光照射（10）的线的一部分可穿过掩模（24），和一个校准单元（20）。 摄像头（16）是沿着相对于表面（18）的成像的慢扫描方向在慢速扫描方向上成像的线激光照明（22）的移动。 该校准开口（26）具有在慢速扫描方向上的宽度做比激光照明（22）的线的最小可寻址图象元素的成像点的全宽度半最大距离大。 所述校准单元（20）是用于接收激光照射（22）通过所述校准开口（26）的线的一部分和用于处理激光照明（22）的线的接收的部分。