公开(公告)号：EP2122656A1

公开(公告)日：2009-11-25

申请号：EP08717601.2

申请日：2008-03-11

申请人： AIXTRON AG

发明人： TEO, Kenneth B. K. ,  RUPESINGHE, Nalin L.

IPC分类号： H01J37/32

CPC分类号： H01J37/32568 ,  H01J37/32009 ,  H01J37/3244

摘要： A plasma system for substrate processing comprising, a conducting electrode (b,bb) on which one or more substrates (d) can be held; a second conducting electrode (a) placed adjacent but separated from the substrate holding electrode on the side away from the side where the substrates are held; and a gas mixture distribution shower head (e) placed away from the conducting electrode on the side where the substrates are held for supplying the gas mixture (f) needed for processing the substrates in a uniform manner; such that a plasma configuration initiated and established, between the con- ducting electrode holding the substrates and the second conducting electrode envelops the electrode holding the substrate, is kept away from the shower head activating and distributing the gas mixture through orifices (ee) in the shower head, there by providing advantages of uniformity, yield and reliability of process.