Positive photoresist stripping composition
    1.
    发明公开
    Positive photoresist stripping composition 失效
    正极光电剥离组合物

    公开(公告)号:EP0145973A3

    公开(公告)日:1986-09-17

    申请号:EP84113854

    申请日:1984-11-16

    IPC分类号: G03F07/26

    CPC分类号: G03F7/425

    摘要: Piperazine containing positive photoresist strippin compositions are provided. Formulations include N aminoalkylpiperazines with the formula
    bis-N-aminoalkylpiperazines of the formula
    N-hydroxyalkylpiperazine of the formula
    and bis-hydroxyalkylpiperazines with structure
    In the above formulae n = 1-6. Also included are piperazine derivatives such as those of the above formulae with a branch chain alkyl of 1-6 C atoms, and 5-6 C atom cycloalkyl substituted compounds wherein the cycloalkyl is substituted for -(CH 2 ) n - Components which may be mixed with the above described piperazine in preparing the positive photoresist stripping compositions of the invention include alkyl or cycloalkyl-2-pyrrolidones of the formula
    Other amide type solvents with the boiling point in excess of 200°C as well as high boiling diethylene glycol ethers may also be incorporated.