公开(公告)号：EP3518041A1

公开(公告)日：2019-07-31

申请号：EP18154116.0

申请日：2018-01-30

申请人： ASML Netherlands B.V.

发明人： KUMAR, Nitish ,  QUINTANILHA, Richard ,  VAN KRAAIJ, Markus Gerardus Martinus Maria ,  TSIGUTKIN, Konstantin ,  COENE, Willem Marie Julia Marcel

IPC分类号： G03F7/20 ,  G03F1/22 ,  G03F1/24 ,  G03F1/60 ,  G03F1/84 ,  G02F1/37 ,  G01N21/956 ,  G21K1/06

摘要： Disclosed is a method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method comprises performing the inspection using first inspection radiation obtained from a high harmonic generation source and having one or more first wavelengths within a first wavelength range of between 20nm and 150nm. Also disclosed is a method comprising performing a coarse inspection (310) using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection (320) using second inspection radiation having one or more second wavelengths within a second wavelength range, said second wavelength range comprising wavelengths shorter than said first wavelength range.

公开(公告)号：EP4184426A1

公开(公告)日：2023-05-24

申请号：EP21209476.7

申请日：2021-11-22

申请人： ASML Netherlands B.V.

发明人： KOOLEN, Armand Eugene Albert ,  COENE, Willem Marie Julia Marcel ,  KONIJNENBERG, Alexander Prasetya ,  TUKKER, Teunis Willem ,  DEN BOEF, Arie Jeffrey

IPC分类号： G06T5/00 ,  G06T5/10

摘要： Disclosed is a metrology method and associated devices. The method comprises obtaining a first image, said first image being subject to one or more non-isoplanatic aberrations of an optical system used to capture said image; and non-iteratively correcting said first image for the effect of said one or more non-isoplanatic aberrations by performing one or both of: a field non-isoplanatic correction operation in field space for said first image, said field space corresponding to a field plane of the optical system; and a pupil non-isoplanatic correction operation in pupil space for said first image, said pupil space corresponding to a pupil plane of the optical system. Said one or more non-isoplanatic aberrations comprise a class of non-isoplanatic aberrations describable as a convolution combined with an object distortion and/or a pupil distortion.

公开(公告)号：EP4019961A1

公开(公告)日：2022-06-29

申请号：EP20216378.8

申请日：2020-12-22

申请人： ASML Netherlands B.V.

发明人： ARABUL, Mustafa Ümit ,  ZHOU, Zili ,  COENE, Willem Marie Julia Marcel ,  VERSCHUREN, Coen Adrianus ,  VAN NEER, Paul Louis Maria Joseph ,  PIRAS, Daniele ,  BLAAK, Sandra ,  KOEK, Wouter, Dick ,  WILLEKERS, Robert Wilhelm

IPC分类号： G01N29/04 ,  G01N29/22 ,  G01N29/24 ,  G01N29/26 ,  G01N29/28 ,  G01N29/34

摘要： A metrology apparatus for determining one or more parameters of a structure fabricated in or on a semiconductor substrate. The apparatus comprises a transducer array comprising a plurality of transducers positioned in a plane. The plurality of transducers comprises at least one transmitter transducer for emitting acoustic radiation in a frequency range from 1 GHz to 100 GHz towards the structure, and at least one receiver transducer for receiving acoustic radiation reflected and/or diffracted from the structure.