公开(公告)号：EP1117010B1

公开(公告)日：2006-05-31

申请号：EP01300255.5

申请日：2001-01-12

申请人： ASML Netherlands B.V.

发明人： Groeneveld, Rogier Herman Mathijs ,  Loopstra, Erik Roelof ,  Burghoorn, Jacobus ,  Levasier, Leon Martin ,  Straaijer, Alexander

IPC分类号： G03F9/00

CPC分类号： G03F9/7019 ,  G03F9/7011 ,  G03F9/7034

公开(公告)号：EP1117010A3

公开(公告)日：2004-03-24

申请号：EP01300255.5

申请日：2001-01-12

申请人： ASML Netherlands B.V.

发明人： Groeneveld, Rogier Herman Mathijs ,  Loopstra, Erik Roelof ,  Burghoorn, Jacobus ,  Levasier, Leon Martin ,  Straaijer, Alexander

IPC分类号： G03F9/00

CPC分类号： G03F9/7019 ,  G03F9/7011 ,  G03F9/7034

摘要： In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.