公开(公告)号：EP1510871B1

公开(公告)日：2012-04-04

申请号：EP04254940.2

申请日：2004-08-17

申请人： ASML Netherlands B.V.

发明人： Loopstra, Erik Roelof ,  Dierichs, Marcel Mathijs Theodore Marie ,  Jasper, Johannes Christian Maria ,  Meijer, Hendricus Johanne Maria ,  Mickan, Uwe ,  Lipson, Matthew ,  Mulkens, Johannes Catharinus Hubertus ,  Uitterdijk, Tammo ,  Baselmans, Johannes Jacobus Matheus

IPC分类号： G03F7/20

CPC分类号： G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

公开(公告)号：EP1291721B1

公开(公告)日：2008-02-27

申请号：EP02256193.0

申请日：2002-09-06

申请人： ASML Netherlands B.V.

发明人： Leenders, Martinus Hendrikus Antonius ,  Moors, Johannes Hubertus Josephina ,  Loopstra, Erik Roelof ,  Gilissen, Noud Jan ,  Eurlings, Markus F. A.

IPC分类号： G03F7/20

CPC分类号： G03F7/70066 ,  G03F7/70083 ,  G03F7/70358 ,  G03F7/70558

公开(公告)号：EP1494079B1

公开(公告)日：2008-01-02

申请号：EP04253817.3

申请日：2004-06-25

申请人： ASML Netherlands B.V.

发明人： Cox, Henrikus Herman Marie ,  Donders, Sjoerd Nicolaas Lambertus ,  Hoogendam, Christiaan Alexander ,  Kolesnychenko, Aleksey Yurievich ,  Loopstra, Erik Roelof ,  Van Santen, Helmar

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

公开(公告)号：EP1857881A1

公开(公告)日：2007-11-21

申请号：EP07107271.4

申请日：2007-05-01

申请人： ASML Netherlands B.V.

发明人： Loopstra, Erik Roelof ,  Ottens, Joost Jeroen

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707

摘要： An article support (2) constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration (1) arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure (9) and an output channel structure (10), the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure (11) provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.

摘要翻译： 公开了一种用于支持用于光刻处理目的的物品的物品支撑件（2）。 物品支撑件包括通道配置（1），其布置成引导物品支撑件中的热稳定性介质以向物品提供热稳定性，其中通道配置包括输入通道结构（9）和输出通道结构（10）， 输入和输出通道结构以嵌套构造布置并且通过设置在物品支撑件的表面处或附近的精细格栅结构（11）彼此连接。 还公开了并入物品支撑件的光刻设备和设备制造。

公开(公告)号：EP1278089B1

公开(公告)日：2007-11-21

申请号：EP02254927.3

申请日：2002-07-12

申请人： ASML Netherlands B.V. ,  Carl Zeiss SMT AG

发明人： Loopstra, Erik Roelof ,  Franken, Dominicus Jacobus Petrus Adrianus ,  Smits, Josephus Jacobus ,  Van Dijsseldonk, Antonius Johannes Josephus ,  Moors, Johannes Hubertus Josephina ,  Hof, Albrecht ,  Maul, Günter ,  Muhlbeyer, Michael ,  Mehlkopp, Klaus

IPC分类号： G02B7/00 ,  G03F7/20

CPC分类号： G03F7/70258 ,  G02B7/008 ,  G02B7/02 ,  G03F7/70833

公开(公告)号：EP1677154A3

公开(公告)日：2006-12-27

申请号：EP05257742.6

申请日：2005-12-15

申请人： ASML Netherlands B.V.

发明人： Van der Wijst, Marc Wilhelmus Maria ,  Franken, Dominicus Jacobus Petrus Adrianus ,  Loopstra, Erik Roelof ,  Ravensbergen, Marius

IPC分类号： G03F7/20

CPC分类号： G03F7/70266 ,  G03F7/70825

摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.

公开(公告)号：EP1628161A3

公开(公告)日：2006-06-07

申请号：EP05254783.3

申请日：2005-07-29

申请人： ASML Netherlands B.V.

发明人： Cadee, Theodorus Petrus Maria ,  Jacobs, Johannes Henricus Wilhelmus ,  Ten Kate, Nicolaas ,  Loopstra, Erik Roelof ,  Van Meer, Aschwin Lodewijk Hendricus Johannes ,  Mertens, Jeroen Johannes Sophia Maria ,  De Mol, Christianus Gerardus Maria ,  Muitjens, Marcel Johannus Elisabeth Hubertus ,  Van der Net, Antonius Johannus ,  Ottens, Joost Jeroen ,  Quaedackers, Johannes Anna ,  Reuhman-Huisken, Maria Elisabeth ,  Stavenga, Marco Koert ,  Tinnemans, Patricius Aloysius Jacobus ,  Verhagen, Martinus Cornelis Maria ,  Verspaij, Jacobus Johannus Leonardus Hendricus ,  De Jong, Frederik Eduard ,  Goorman, Koen ,  Menchtchikov, Boris ,  Boom, Herman ,  Nihtianov, Stoyan ,  Moerman, Richard ,  Smeets, Martin Frans Pierre ,  Schoondermark, Bart Leonard Peter ,  Janssen, Franciscus Johannes Joseph ,  RIepen, Michel

IPC分类号： G03F7/20

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.

公开(公告)号：EP1117010B1

公开(公告)日：2006-05-31

申请号：EP01300255.5

申请日：2001-01-12

申请人： ASML Netherlands B.V.

发明人： Groeneveld, Rogier Herman Mathijs ,  Loopstra, Erik Roelof ,  Burghoorn, Jacobus ,  Levasier, Leon Martin ,  Straaijer, Alexander

IPC分类号： G03F9/00

CPC分类号： G03F9/7019 ,  G03F9/7011 ,  G03F9/7034

公开(公告)号：EP1420299A3

公开(公告)日：2005-08-10

申请号：EP03257071.5

申请日：2003-11-10

申请人： ASML Netherlands B.V.

发明人： Lof, Joeri ,  Derksen, Antonius Theodorus Anna Maria ,  Hoogendam, Christiaan Alexander ,  Loopstra, Erik Roelof ,  Mulkens, Johannes Catharinus Hubertus ,  Straaijer, Alexander ,  Streefkerk, Bob ,  Donders, Sjoerd Nicolaas Lambertus ,  Mertens, Jeroen Johannes Sophia Maria ,  Sengers, Timotheus Franciscus

IPC分类号： G03F7/20

CPC分类号： G03F7/707 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70916

摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member (150) is provided to take the place of the substrate in containing the liquid (11) in the liquid supply system during substrate exchange.

公开(公告)号：EP1528433A2

公开(公告)日：2005-05-04

申请号：EP04256585.3

申请日：2004-10-26

申请人： ASML Netherlands B.V.

发明人： Hoogendam, Christiaan Alexander ,  Streefkerk, Bob ,  Mulkens, Johannes Catharinus Hubertus ,  Bijlaart, Erik Theodorus Maria ,  Kolesnychenko, Aleksey Yurievich ,  Loopstra, Erik Roelof ,  Mertens, J.J.S.M. ,  Slaghekke, Bernardus Antonius ,  Tinnemans, P.A.J. ,  Van Santen, Helmar

IPC分类号： G03F7/20

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70866

摘要： Liquid is supplied to a reservoir (10) between the final element of the projection system (PS) and the substrate by an inlet (21,22). An overflow removes the liquid above a given level. The overflow is arranged above the inlet and thus the liquid is constantly refreshed and the pressure in the liquid remains substantially constant.

摘要翻译： 液体通过入口（21,22）供应到投影系统（PS）的最终元件和基板之间的储存器（10）。 溢出物将液体移至高于给定水平的位置。 溢流口布置在入口的上方，因此液体不断刷新，并且液体中的压力基本保持不变。