专利检索 ap:("ASML Netherlands B.V.") AND inv:"HEEREN, Adrianus Marinus Wouter" 第 1 页

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发明公开
A PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS 审中-公开

公开(公告)号：EP3529665A1

公开(公告)日：2019-08-28

申请号：EP17768142.6

申请日：2017-09-18

申请人： ASML Netherlands B.V.

发明人： JANSSENS, Stef Marten Johan , CUYPERS, Koen , CORTIE, Rogier Hendrikus Magdalena , SRIVASTAVA, Sudhir , RENCKENS, Theodorus Johannes Antonius , GOSEN, Jeroen Gerard , EUMMELEN, Erik Henricus Egidius Catharina , SCHELLENS, Hendrikus Johannes , HEEREN, Adrianus Marinus Wouter , LENSSEN, Bo

IPC分类号： G03F7/20 , F01D17/14 , F01D17/16 , F02B37/18 , G05D7/00 , G05D7/01 , F16K31/00 , H02N2/04