公开(公告)号：EP3108301A1

公开(公告)日：2016-12-28

申请号：EP15701322.8

申请日：2015-01-20

申请人： ASML Netherlands B.V.

发明人： NAKIBOGLU, Günes ,  VAN BAREN, Martijn ,  VAN BOXTEL, Frank Johannes Jacobus ,  CUYPERS, Koen ,  GOSEN, Jeroen Gerard ,  VAN BOKHOVEN, Laurentius Johannes Adrianus

IPC分类号： G03F7/20

CPC分类号： G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

摘要： A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

摘要翻译： 本发明提供一种包括屏障系统（3）和使用所描述的任何光刻设备的器件制造方法的光刻设备。 屏障系统用于在屏障（4）内保持受保护的气体体积。 当光刻设备的不同部件相对于彼此移动时，可以保持受保护的体积。 屏障系统可以用在光刻设备内的不同位置。 屏障的几何形状影响保护体积的效率，特别是在高速下。 本发明的几何形状减少了从屏障外部进入受保护体积的环境气体的量。

公开(公告)号：EP3529665A1

公开(公告)日：2019-08-28

申请号：EP17768142.6

申请日：2017-09-18

申请人： ASML Netherlands B.V.

发明人： JANSSENS, Stef Marten Johan ,  CUYPERS, Koen ,  CORTIE, Rogier Hendrikus Magdalena ,  SRIVASTAVA, Sudhir ,  RENCKENS, Theodorus Johannes Antonius ,  GOSEN, Jeroen Gerard ,  EUMMELEN, Erik Henricus Egidius Catharina ,  SCHELLENS, Hendrikus Johannes ,  HEEREN, Adrianus Marinus Wouter ,  LENSSEN, Bo

IPC分类号： G03F7/20 ,  F01D17/14 ,  F01D17/16 ,  F02B37/18 ,  G05D7/00 ,  G05D7/01 ,  F16K31/00 ,  H02N2/04

公开(公告)号：EP3108301B1

公开(公告)日：2018-07-18

申请号：EP15701322.8

申请日：2015-01-20

申请人： ASML Netherlands B.V.

发明人： NAKIBOGLU, Günes ,  VAN BAREN, Martijn ,  VAN BOXTEL, Frank Johannes Jacobus ,  CUYPERS, Koen ,  GOSEN, Jeroen Gerard ,  VAN BOKHOVEN, Laurentius Johannes Adrianus

IPC分类号： G03F7/20

CPC分类号： G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

摘要： A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.