公开(公告)号：EP2545413A1

公开(公告)日：2013-01-16

申请号：EP11704558.3

申请日：2011-01-31

申请人： ASML Netherlands B.V.

发明人： LABETSKI, Dzmitry ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei

IPC分类号： G03F7/20 ,  G02B5/00 ,  G21K1/08

CPC分类号： H05G2/008 ,  G02B5/00 ,  G02B19/00 ,  G02B19/0023 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003

摘要： A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.

公开(公告)号：EP2561407B1

公开(公告)日：2014-12-10

申请号：EP11709923.4

申请日：2011-03-18

申请人： ASML Netherlands B.V.

发明人： LABETSKI, Dzmitry ,  LOOPSTRA, Erik ,  KEMPEN, Antonius

IPC分类号： G02B5/08 ,  G21K5/04 ,  G03F7/20

CPC分类号： G02B5/08 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  G21K5/04

公开(公告)号：EP4212960A1

公开(公告)日：2023-07-19

申请号：EP22151287.4

申请日：2022-01-13

申请人： ASML Netherlands B.V.

发明人： LABETSKI, Dzmitry ,  DE HOOGH, Joost

IPC分类号： G03F7/20

摘要： A system for use in a lithographic apparatus comprises: a substrate table; another device; and at least one deformable partition. The substrate table (for example a wafer stage) is arranged to support a substrate. The system is configurable in a first configuration such that a surface of the device faces and is adjacent to the substrate and the substrate table. The at least one deformable partition either: (a) extends partially from the substrate table towards the surface of the device when the system is in the first configuration; or (b) extends partially from the surface of the device that faces and is adjacent to the substrate and the substrate table when the system is in the first configuration towards the substrate table.