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公开(公告)号：EP3861406A1
公开(公告)日：2021-08-11
申请号：EP19773837.0
申请日：2019-09-26
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公开(公告)号：EP4455783A1
公开(公告)日：2024-10-30
申请号：EP23169511.5
申请日：2023-04-24
发明人： DE HOOGH, Joost , NAKIBOGLU, Günes , JACOBS, Johannes, Henricus, Wilhelmus , MCGRAW, Aaron , DIRECKS, Daniel, Jozef, Maria
IPC分类号： G03F7/00
摘要： A vacuum system configured to provide a vacuum to a heat transfer fluid of a fluid-conditioned lithographic system element, the vacuum system comprising: a venturi, configured to generate a partial vacuum; and a buffer vessel, configured to contain a partial vacuum. The buffer vessel is in fluid communication with a constriction of the venturi, and the buffer vessel is further configured to be in fluid communication with a heat transfer fluid of a fluid-conditioned lithographic system element.
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公开(公告)号：EP4212960A1
公开(公告)日：2023-07-19
申请号：EP22151287.4
申请日：2022-01-13
发明人： LABETSKI, Dzmitry , DE HOOGH, Joost
IPC分类号： G03F7/20
摘要： A system for use in a lithographic apparatus comprises: a substrate table; another device; and at least one deformable partition. The substrate table (for example a wafer stage) is arranged to support a substrate. The system is configurable in a first configuration such that a surface of the device faces and is adjacent to the substrate and the substrate table. The at least one deformable partition either: (a) extends partially from the substrate table towards the surface of the device when the system is in the first configuration; or (b) extends partially from the surface of the device that faces and is adjacent to the substrate and the substrate table when the system is in the first configuration towards the substrate table.
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