公开(公告)号：EP3391149A1

公开(公告)日：2018-10-24

申请号：EP16791368.0

申请日：2016-11-02

申请人： ASML Netherlands B.V.

发明人： NAKIBOGLU, Günes ,  BALTIS, Coen Hubertus Matheus ,  TROMP, Siegfried Alexander ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  SCHOLTEN, Bert Dirk ,  VAN SOMMEREN, Daan Daniel Johannes Antonius ,  FRENCKEN, Mark Johannes Hermanus

IPC分类号： G03F7/20 ,  H01L21/683

摘要： A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate (W), the substrate holder comprising: • a main body (21) having a main body surface (22); • a plurality of burls (20) projecting from the main body surface to support the substrate spaced apart from the main body surface; and • a liquid control structure (200) provided in a peripheral region (22a) of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

公开(公告)号：EP3391149B1

公开(公告)日：2020-01-01

申请号：EP16791368.0

申请日：2016-11-02

申请人： ASML Netherlands B.V.

发明人： NAKIBOGLU, Günes ,  BALTIS, Coen Hubertus Matheus ,  TROMP, Siegfried Alexander ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  SCHOLTEN, Bert Dirk ,  VAN SOMMEREN, Daan Daniel Johannes Antonius ,  FRENCKEN, Mark Johannes Hermanus

IPC分类号： G03F7/20 ,  H01L21/683 ,  H01L21/687