公开(公告)号：EP3387491A1

公开(公告)日：2018-10-17

申请号：EP16790343.4

申请日：2016-11-02

申请人： ASML Netherlands B.V.

发明人： VAN SOMMEREN, Daan Daniel Johannes Antonius ,  BALTIS, Coen Hubertus Matheus ,  BUDDENBERG, Harold Sebastiaan ,  GATTOBIGIO, Giovanni Luca ,  MELMAN, Johannes Cornelis Paulus ,  NAKIBOGLU, Günes ,  POLET, Theodorus Wilhelmus ,  STALS, Walter Theodorus Matheus ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  VAN LIESHOUT, Josephus Peter ,  VIEYRA SALAS, Jorge Alberto ,  ZDRAVKOV, Aleksandar Nikolov

IPC分类号： G03F7/20

摘要： A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：EP3387491B1

公开(公告)日：2020-01-01

申请号：EP16790343.4

申请日：2016-11-02

申请人： ASML Netherlands B.V.

发明人： VAN SOMMEREN, Daan Daniel Johannes Antonius ,  BALTIS, Coen Hubertus Matheus ,  BUDDENBERG, Harold Sebastiaan ,  GATTOBIGIO, Giovanni Luca ,  MELMAN, Johannes Cornelis Paulus ,  NAKIBOGLU, Günes ,  POLET, Theodorus Wilhelmus ,  STALS, Walter Theodorus Matheus ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  VAN LIESHOUT, Josephus Peter ,  VIEYRA SALAS, Jorge Alberto ,  ZDRAVKOV, Aleksandar Nikolov

IPC分类号： G03F7/20