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公开(公告)号：EP3867702A1
公开(公告)日：2021-08-25
申请号：EP19783476.5
申请日：2019-10-02
发明人： VAN ZWOL, Pieter-Jan , BALTUSSEN, Sander , DE GRAAF, Dennis , FRANKEN, Johannes Christiaan Leonardus , GIESBERS, Adrianus Johannes Maria , KLEIN, Alexander Ludwig , KLOOTWIJK, Johan Hendrik , KNAPEN, Peter Simon Antonius , KURGANOVA, Evgenia , KUZNETSOV, Alexey Sergeevich , NOTENBOOM, Arnoud Willem , VALEFI, Mahdiar , VAN DE KERKHOF, Marcus Adrianus , VAN DEN EINDEN, Wilhelmus Theodorus Anthonius Johannes , VAN DER WOORD, Ties Wouter , WONDERGEM, Hendrikus Jan , ZDRAVKOV, Aleksandar Nikolov
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2.发明公开
公开(公告)号：EP3387491A1
公开(公告)日：2018-10-17
申请号：EP16790343.4
申请日：2016-11-02
发明人： VAN SOMMEREN, Daan Daniel Johannes Antonius , BALTIS, Coen Hubertus Matheus , BUDDENBERG, Harold Sebastiaan , GATTOBIGIO, Giovanni Luca , MELMAN, Johannes Cornelis Paulus , NAKIBOGLU, Günes , POLET, Theodorus Wilhelmus , STALS, Walter Theodorus Matheus , VAN DE VIJVER, Yuri Johannes Gabriël , VAN LIESHOUT, Josephus Peter , VIEYRA SALAS, Jorge Alberto , ZDRAVKOV, Aleksandar Nikolov
IPC分类号： G03F7/20
摘要： A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
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公开(公告)号：EP3387491B1
公开(公告)日：2020-01-01
申请号：EP16790343.4
申请日：2016-11-02
发明人： VAN SOMMEREN, Daan Daniel Johannes Antonius , BALTIS, Coen Hubertus Matheus , BUDDENBERG, Harold Sebastiaan , GATTOBIGIO, Giovanni Luca , MELMAN, Johannes Cornelis Paulus , NAKIBOGLU, Günes , POLET, Theodorus Wilhelmus , STALS, Walter Theodorus Matheus , VAN DE VIJVER, Yuri Johannes Gabriël , VAN LIESHOUT, Josephus Peter , VIEYRA SALAS, Jorge Alberto , ZDRAVKOV, Aleksandar Nikolov
IPC分类号： G03F7/20
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