专利检索 ap:("ASML Netherlands B.V.") AND inv:"WRICKE, Sandro" 第 1 页

1.

发明公开
A SENSOR MARK AND A METHOD OF MANUFACTURING A SENSOR MARK 审中-公开

公开(公告)号：EP3596546A1

公开(公告)日：2020-01-22

申请号：EP18704983.8

申请日：2018-02-15

申请人： ASML Netherlands B.V.

发明人： KLUGKIST, Joost André , BANINE, Vadim Yevgenyevich , BECKERS, Johan Franciscus Maria , JAMBUNATHAN, Madhusudhanan , NASALEVICH, Maxim Aleksandrovich , NIKIPELOV, Andrey , STAS, Roland Johannes Wilhelmus , VLES, David Ferdinand , WELTERS, Wilhelmus Jacobus Johannes , WRICKE, Sandro

IPC分类号： G03F7/20 , G03F9/00 , G01J1/42

2.

发明公开
A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER HAVING IMPROVED RESISTANCE TO PEELING OFF 审中-公开

公开(公告)号：EP3559748A1

公开(公告)日：2019-10-30

申请号：EP17803964.0

申请日：2017-11-27

申请人： ASML Netherlands B.V.

发明人： NIKIPELOV, Andrey , BANINE, Vadim, Yevgenyevich , KLUGKIST, Joost, André , NASALEVICH, Maxim, Aleksandrovich , STAS, Roland, Johannes, Wilhelmus , WRICKE, Sandro

IPC分类号： G03F7/20

3.

发明公开
IMAGE SENSOR FOR IMMERSION LITHOGRAPHY 审中-公开

公开(公告)号：EP3956728A1

公开(公告)日：2022-02-23

申请号：EP20716802.2

申请日：2020-04-07

申请人： ASML Netherlands B.V.

发明人： BANERJEE, Nirupam , WRICKE, Sandro , BECKERS, Johan, Franciscus, Maria , DONKERBROEK, Arend, Johannes , GRIMM, Daniel , BRAKHAGE, Peter , RATHJE, Tim , TILKE, Martin

IPC分类号： G03F7/20