公开(公告)号：EP1524557A1

公开(公告)日：2005-04-20

申请号：EP03256498.1

申请日：2003-10-15

申请人： ASML Netherlands B.V. ,  Carl Zeiss SMT AG

发明人： Streefkerk, Bob ,  Baselmans, Johannes Jacobus Matheus ,  Engelen, Adrianus Franciscus Petrus ,  Finders, Jozef ,  Graupner, Paul ,  Mulkens, Johannes Catharinus Hubertus ,  Van Schoot, Jan Bernard

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70333

摘要： The present invention relates to an immersion lithographic apparatus and a device manufacturing method in which the position of focus of the projected image is changed during imaging thereby to increase the focus latitude. Immersion lithography lends itself to this and several ways of varying the focus using the liquid supply system to do this are disclosed.

摘要翻译： 浸没式光刻设备及其制造方法，其中投影图像的焦点位置在成像期间发生变化，从而增加了焦点的纬度。 浸入式光刻技术适用于此，并且公开了使用液体供应系统来改变聚焦的几种方式。