公开(公告)号：EP2071402A2

公开(公告)日：2009-06-17

申请号：EP08171582.3

申请日：2008-12-12

申请人： ASML Netherlands BV

发明人： Musa, Sami ,  van Haren, Richard Johannes Franciscus ,  Lalbahadoersing, Sanjaysingh ,  Xiuhong, Wei

IPC分类号： G03F9/00

CPC分类号： G03F9/7076

摘要： The position of a product is measured using an alignment mark on the product. Radiation is transmitted towards the alignment mark and diffracted by a pattern in the alignment mark. Position information is determined from phase relations of the diffracted radiation. The alignment mark comprises a set of mutually parallel conductor tracks from which the diffracted radiation is collected, the pattern being defined by a pattern of variation of the pitch between successive tracks a function of position along the surface of the product. Thus, for example the pattern comprises alternating first and second areas wherein the pitch has a first and second value respectively. Because the tracks in the different parts of the pattern, such as the first and second areas, are parallel to each other improved measurements are possible.

摘要翻译： 使用产品上的对准标记测量产品的位置。 辐射被朝向对准标记传送并被对准标记中的图案衍射。 位置信息由衍射辐射的相位关系确定。 对准标记包括一组相互平行的导体轨道，衍射辐射从该轨迹收集起来，该图案由连续迹线之间的间距变化的图案定义为沿着产品表面的位置的函数。 因此，例如，图案包括交替的第一和第二区域，其中音调分别具有第一和第二值。 因为图案的不同部分中的轨迹（例如第一和第二区域）彼此平行，所以改进的测量是可能的。

公开(公告)号：EP2071402B1

公开(公告)日：2013-11-06

申请号：EP08171582.3

申请日：2008-12-12

申请人： ASML Netherlands BV

发明人： Musa, Sami ,  van Haren, Richard Johannes Franciscus ,  Lalbahadoersing, Sanjaysingh ,  Xiuhong, Wei

IPC分类号： G03F9/00

CPC分类号： G03F9/7076

公开(公告)号：EP2071402A3

公开(公告)日：2012-02-29

申请号：EP08171582.3

申请日：2008-12-12

申请人： ASML Netherlands BV

发明人： Musa, Sami ,  van Haren, Richard Johannes Franciscus ,  Lalbahadoersing, Sanjaysingh ,  Xiuhong, Wei

IPC分类号： G03F9/00

CPC分类号： G03F9/7076

摘要： The position of a product is measured using an alignment mark on the product. Radiation is transmitted towards the alignment mark and diffracted by a pattern in the alignment mark. Position information is determined from phase relations of the diffracted radiation. The alignment mark comprises a set of mutually parallel conductor tracks from which the diffracted radiation is collected, the pattern being defined by a pattern of variation of the pitch between successive tracks a function of position along the surface of the product. Thus, for example the pattern comprises alternating first and second areas wherein the pitch has a first and second value respectively. Because the tracks in the different parts of the pattern, such as the first and second areas, are parallel to each other improved measurements are possible.

公开(公告)号：EP1912257A2

公开(公告)日：2008-04-16

申请号：EP07118020.2

申请日：2007-10-08

申请人： ASML Netherlands BV

发明人： van Haren, Richard Johannes Franciscus ,  Mos, Everhardus Cornelis

IPC分类号： H01L23/544 ,  G03F9/00

CPC分类号： G03F9/7084 ,  G03F9/708 ,  H01L21/3212 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2924/0002 ,  Y10S438/975 ,  H01L2924/00

摘要： In a method to produce an alignment mark, an oxide layer (1010) and sacrificial layer are processed to comprise recesses. The recesses are filled with a filler material. During filling the recesses a layer of filler material is formed on the sacrificial layer. The layer of filler material is removed by chemical mechanical polishing. The sacrificial layer protects the oxide layer during filling the recesses and removing the layer of filler material. The sacrificial layer is then removed by etching. This provides an unscratched oxide layer with protrusions (1230). The oxide layer with protrusions is covered with a conducting layer (1070) whereby the protrusions punch through the oxide layer to form related protrusions. The related protrusions form an alignment mark.

摘要翻译： 在产生对准标记的方法中，氧化物层（1010）和牺牲层被加工成包括凹陷。 凹部填充有填充材料。 在填充凹槽期间，在牺牲层上形成一层填充材料。 通过化学机械抛光除去填充材料层。 牺牲层在填充凹部期间保护氧化物层并去除填充材料层。 然后通过蚀刻去除牺牲层。 这提供了具有突起（1230）的未切割氧化物层。 具有突起的氧化物层被导电层（1070）覆盖，由此突起穿过氧化物层以形成相关的突起。 相关突起形成对准标记。