公开(公告)号：EP1664380A2

公开(公告)日：2006-06-07

申请号：EP04787104.1

申请日：2004-09-07

申请人： Aixtron AG

发明人： SCHUMACHER, Marcus ,  BAUMANN, Peter ,  LINDNER, Johannes ,  DESCHLER, Marc

IPC分类号： C23C16/52

CPC分类号： C23C16/4411 ,  C23C16/4481 ,  C23C16/52

摘要： The invention relates to a method and device for depositing at least one layer on at least one substrate in a process chamber (2). Said layer comprises several components and is insulating, passivating or electrically conductive. The components are vaporized in a tempered vaporization chamber (4) by means of non-continuous injection of a liquid starting material (3) or a starting material (3) dissolved in a liquid using a respective injector unit (5). Said vapor is guided to the process chamber by means of a carrier gas (7). It is important to individually adjust or vary the material flow parameters, such as injection frequency and the pulse/pause ratio and the phase relation of the pulse/pauses to the pulse/pauses of the other injector unit (s), determining the time response of the flow of material through each injector unit (5). The pressure in the process chamber (2) is less than 100 mbars, the process chamber (2) is tempered and several series of layers are deposited on the substrate (1) during one process step.