摘要:
The present invention provides an apparatus for resurfacing a rotating elastomer substrate. The apparatus utilizes a motorized grinding wheel, said motorized grinding wheel rotating in a direction counter to the rotating elastomer substrate and having an axis of rotation parallel to the axis of rotation of the rotating elastomer substrate, wherein the perpendicular distance between the motorized grinding wheel and the rotating elastomer substrate is adjustable so as to control the amount of elastomer substrate that is removed; and a mount for said motorized grinding wheel, wherein said mount is located proximal to the rotating elastomer substrate that comprises a part of a production line and wherein the mount is capable of traversing parallel to the rotating elastomer substrate.
摘要:
The present invention provides an apparatus for resurfacing a rotating elastomer substrate. The apparatus utilizes a motorized grinding wheel, said motorized grinding wheel rotating in a direction counter to the rotating elastomer substrate and having an axis of rotation parallel to the axis of rotation of the rotating elastomer substrate, wherein the perpendicular distance between the motorized grinding wheel and the rotating elastomer substrate is adjustable so as to control the amount of elastomer substrate that is removed; and a mount for said motorized grinding wheel, wherein said mount is located proximal to the rotating elastomer substrate that comprises a part of a production line and wherein the mount is capable of traversing parallel to the rotating elastomer substrate.