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公开(公告)号：EP3384071B1
公开(公告)日：2020-06-03
申请号：EP16805782.6
申请日：2016-12-01
发明人： WEINHOLD, Ray , KIRBACH, Uwe
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公开(公告)号：EP3384071A1
公开(公告)日：2018-10-10
申请号：EP16805782.6
申请日：2016-12-01
发明人： WEINHOLD, Ray , KIRBACH, Uwe
摘要： This invention concerns a method for galvanic metal deposition of a substrate using an anode and an electrolyte, wherein from each of a plurality of electrolyte nozzles a locally confined electrolyte stream is directed towards a part of a substrate surface which is to be treated, wherein a relative movement is carried out between the substrate and the electrolyte stream during deposition, characterized in that a first movement is carried out along a first path, wherein at least along a part of the first path a second movement is carried out along a second path, wherein the first and the second movement each are relative movements between the electrolyte stream and the substrate. Further, the invention concerns a substrate holder reception apparatus and an electrochemical treatment apparatus.
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