公开(公告)号：EP4215642A1

公开(公告)日：2023-07-26

申请号：EP22153310.2

申请日：2022-01-25

申请人： Atotech Deutschland GmbH & Co. KG

发明人： Lautan, Donny ,  Voloshyn, Dmytro ,  Hirsekorn, Isabel-Roda ,  Tews, Dirk

IPC分类号： C23C18/16 ,  C23C18/18 ,  C23C18/44

摘要： The present invention is directed to a composition for depositing a palladium coating on an activated copper-coated substrate, the composition comprising:
(i) palladium ions,
(ii) chloride ions,
(iii) ethylenediamine (EDA),
(iv) ethylenediamine disuccinate (EDDS), and
(v) at least one reducing agent,
wherein the composition has a pH in a range from 7.5 to 9.5, preferably from 7.6 to 9.1, more preferably from 7.7 to 8.7, and most preferably from 7.8 to 8.5.

公开(公告)号：EP3960898A1

公开(公告)日：2022-03-02

申请号：EP20193722.4

申请日：2020-08-31

申请人： Atotech Deutschland GmbH & Co. KG

发明人： Lautan, Donny ,  Voloshyn, Dmytro ,  Hirsekorn, Isabel-Roda ,  Tews, Dirk ,  Spreemann, Robert

IPC分类号： C23C18/12 ,  C23C18/44 ,  H05K3/00

摘要： The present invention is directed to a composition for depositing a palladium coating on a substrate, in particular on a nickel-coated substrate, the composition comprising:
(i) palladium ions,
(ii) chloride ions,
(iii) ethylenediamine (EDA),
(iv) ethylenediamine disuccinate (EDDS), and
(v) at least one reducing agent.