公开(公告)号：EP0932599A1

公开(公告)日：1999-08-04

申请号：EP97911197.0

申请日：1997-10-08

申请人： BASF AKTIENGESELLSCHAFT

发明人： EIERMANN, Matthias ,  PAPKALLA, Thomas

IPC分类号： C07C309 ,  C07C303

CPC分类号： C07C303/14 ,  C07C309/04

摘要： Process to manufacture methane sulfonic acid by irradiation of a mixture containing acetic acid, sulphur dioxide and oxygen with light. Accumulated irradiation density of light in 240-320 nm range on light entrance surface in reaction mixture is on average 0.05 to 50 nMol quantum/cm2h.

公开(公告)号：EP0932599B1

公开(公告)日：2001-08-22

申请号：EP97911197.8

申请日：1997-10-08

申请人： BASF AKTIENGESELLSCHAFT

发明人： EIERMANN, Matthias ,  PAPKALLA, Thomas

IPC分类号： C07C303/14 ,  C07C309/04

CPC分类号： C07C303/14 ,  C07C309/04

摘要： Process to manufacture methane sulfonic acid by irradiation of a mixture containing acetic acid, sulphur dioxide and oxygen with light. Accumulated irradiation density of light in 240-320 nm range on light entrance surface in reaction mixture is on average 0.05 to 50 nMol quantum/cm2h.