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1.发明公开CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A SPECIFIC HETEROPOLYACID 审中-公开使用杂用于化学机械抛光（CMP）组合物
公开(公告)号：EP2625241A4
公开(公告)日：2014-04-23
申请号：EP11830275
申请日：2011-10-04
Applicant: BASF SE
Inventor： SCHMITT CHRISTINE , KARPOV ANDREY , ROSOWSKI FRANK , BRANDS MARIO , LI YUZHUO
IPC: C09G1/02 , H01L21/306 , H01L21/321
CPC classification number: H01L21/30625 , C09G1/02 , H01L21/3212
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