公开(公告)号：EP1797746B1

公开(公告)日：2010-12-08

申请号：EP05791477.2

申请日：2005-10-03

申请人： C-Tech Innovation Limited

发明人： WRIGHT, Neil Philip ,  DUAN, Xiaoming ,  PHAN, Ba, Duong

IPC分类号： H05H1/30 ,  H01J37/32

CPC分类号： H01J37/32357 ,  H01J37/32192 ,  H01J2237/339 ,  H05H1/30

摘要： A microwave plasma generating apparatus (10) has a microwave cavity (20) coupled to a microwave source (22) by a wave guide (24). Within the cavity (20) is a reaction tube (30) defining a plasma cavity (40). A gas inlet manifold (50) is provided at the top of the reaction tube (30), which is formed so as to introduce plasma gas in a swirled manner, that is, in the form of a vortex. This prevents overheating of the reaction tube (30).

公开(公告)号：EP1797746A2

公开(公告)日：2007-06-20

申请号：EP05791477.2

申请日：2005-10-03

申请人： C-Tech Innovation Limited

发明人： WRIGHT, Neil Philip ,  DUAN, Xiaoming ,  PHAN, Ba, Duong

IPC分类号： H05H1/30 ,  H01J37/32

CPC分类号： H01J37/32357 ,  H01J37/32192 ,  H01J2237/339 ,  H05H1/30

摘要： A microwave plasma generating apparatus (10) has a microwave cavity (20) coupled to a microwave source (22) by a wave guide (24). Within the cavity (20) is a reaction tube (30) defining a plasma cavity (40). A gas inlet manifold (50) is provided at the top of the reaction tube (30), which is formed so as to introduce plasma gas in a swirled manner, that is, in the form of a vortex. This prevents overheating of the reaction tube (30).