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公开(公告)号：EP1577929A2
公开(公告)日：2005-09-21
申请号：EP05005017.8
申请日：2005-03-08
发明人： Uchida, Shinji
IPC分类号： H01J37/317 , H01J37/02
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/023 , H01J2237/0216 , H01J2237/0245
摘要： An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4A arranged in the sample chamber 3 for holding and moving the wafer 10; and first mounting 5A for elastically supporting the column 1 with respect to the sample chamber 3.
摘要翻译： 一种电子束曝光装置，包括：用于将电子束照射到用作样品的晶片10的列1; 样品室3，其具有真空泵40作为用于将内部单元控制到真空气氛的真空耗尽单元; 布置在样品室3中的用于保持和移动晶片10的阶段4A; 并且第一安装件5A用于相对于样品室3弹性支撑柱1。
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公开(公告)号：EP1577929B1
公开(公告)日：2009-09-23
申请号：EP05005017.8
申请日：2005-03-08
发明人： Uchida, Shinji
IPC分类号： H01J37/317 , H01J37/02
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/023 , H01J2237/0216 , H01J2237/0245
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公开(公告)号：EP1577929A3
公开(公告)日：2006-10-11
申请号：EP05005017.8
申请日：2005-03-08
发明人： Uchida, Shinji
IPC分类号： H01J37/317 , H01J37/02
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/023 , H01J2237/0216 , H01J2237/0245
摘要： An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4A arranged in the sample chamber 3 for holding and moving the wafer 10; and first mounting 5A for elastically supporting the column 1 with respect to the sample chamber 3.
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