-
1.发明公开Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus 有权Ladungsträgerteilchenstrahlbelichtungs-方法和设备以及由这种装置的装置，用于制造器件的方法
公开(公告)号：EP1505630A2
公开(公告)日：2005-02-09
申请号：EP04254551.7
申请日：2004-07-29
发明人： Muraki, Masato, c/o Canon Kabushiki Kaisha , Nakayama,Yoshinori, c/o Hitachi,Ltd., Int.Prop.Gp. , Ohta,Hiroya, c/o Hitachi,Ltd., Int.Prop.Gp. , Yoda, Haruo, c/o Hitachi High-Technologies Corp. , Saitou, Norio, c/o Hitachi High-Technologies Corp.
IPC分类号： H01J37/317 , H01J37/304
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/317
摘要： A charged particle beam exposure apparatus which exposes a substrate using a plurality of charged particle beams comprises a first measurement member (14: 141, 142) for making the plurality of charged particle beams come incident and measuring a total current value of the charged particle beams, and a second measurement member (15: 151, 152) for making the plurality of charged particle beams come incident and multiplying electrons of each of the incident charged particle beams, thereby measuring a relative value of a current of each of the charged particle beams.
摘要翻译： 它公开使用带电粒子束的多个A基片A的带电粒子束曝光设备包括：第一测量部件（14：141，142）用于使带电粒子束的多元性来入射并测量带电粒子束的总电流值 和第二测量部件：用于使带电粒子束的多元性来入射和乘法每个入射带电粒子束的电子，从而测量每个带电粒子束的电流的相对值（15 151,152） ，
-
2.发明授权Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus 有权Ladungsträgerteilchenstrahlbelichtungs-方法和设备以及由这种装置的装置，用于制造器件的方法
公开(公告)号：EP1505630B1
公开(公告)日：2015-11-18
申请号：EP04254551.7
申请日：2004-07-29
发明人： Muraki, Masato, c/o Canon Kabushiki Kaisha , Nakayama,Yoshinori, c/o Hitachi,Ltd., Int.Prop.Gp. , Ohta,Hiroya, c/o Hitachi,Ltd., Int.Prop.Gp. , Yoda, Haruo, c/o Hitachi High-Technologies Corp. , Saitou, Norio, c/o Hitachi High-Technologies Corp.
IPC分类号： H01J37/317 , H01J37/304
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/317
-
3.发明公开Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus 有权Ladungsträgerteilchenstrahlbelichtungs-方法和设备以及由这种装置的装置，用于制造器件的方法
公开(公告)号：EP1505630A3
公开(公告)日：2010-01-06
申请号：EP04254551.7
申请日：2004-07-29
发明人： Muraki, Masato, c/o Canon Kabushiki Kaisha , Nakayama,Yoshinori, c/o Hitachi,Ltd., Int.Prop.Gp. , Ohta,Hiroya, c/o Hitachi,Ltd., Int.Prop.Gp. , Yoda, Haruo, c/o Hitachi High-Technologies Corp. , Saitou, Norio, c/o Hitachi High-Technologies Corp.
IPC分类号： H01J37/317 , H01J37/304
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/317
摘要： A charged particle beam exposure apparatus which exposes a substrate using a plurality of charged particle beams comprises a first measurement member (14: 141, 142) for making the plurality of charged particle beams come incident and measuring a total current value of the charged particle beams, and a second measurement member (15: 151, 152) for making the plurality of charged particle beams come incident and multiplying electrons of each of the incident charged particle beams, thereby measuring a relative value of a current of each of the charged particle beams.
-
-
搜索结果
3 条记录 (耗时 0.012 秒)
