专利检索 ap:("CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)") AND inv:"ABRUTIS, Adulfas L.M.G.P.ENS de Phys. de Grenoble" 第 1 页

1.

发明授权
PROCEDE ET DISPOSITIF D'INTRODUCTION DE PRECURSEURS DANS UNE ENCEINTE DE DEPOT CHIMIQUE EN PHASE VAPEUR 失效
标题翻译：方法和装置用于馈入VORLÄUFVERBINDUNGENCVD - 反应器

公开(公告)号：EP0730671B1

公开(公告)日：2001-10-17

申请号：EP94922896.9

申请日：1994-07-08

申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

发明人： SENATEUR, Jean-Pierre , MADAR, Roland , WEISS, François , THOMAS, Olivier , ABRUTIS, Adulfas L.M.G.P.ENS de Phys. de Grenoble

IPC分类号： C23C16/44 , B01D1/18

CPC分类号： B01D1/18 , C23C16/4486

摘要： A device for feeding precursors of one or more elements to be deposited on a hot substrate into a chemical vapour deposition chamber (1). The device includes at least one container (10) for the liquid or dissolved precursor(s) (11), a system (12) for maintaining a higher pressure in the container than in the chamber, at least one injector combined with each container and provided with a control unit for periodically injecting precursor droplets of a given volume into the deposition chamber, and a system (3) for delivering the vaporised injected materials to a substrate located in the deposition chamber.