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1.发明授权PROCEDE ET DISPOSITIF D'INTRODUCTION DE PRECURSEURS DANS UNE ENCEINTE DE DEPOT CHIMIQUE EN PHASE VAPEUR 失效方法和装置用于馈入VORLÄUFVERBINDUNGENCVD - 反应器
公开(公告)号：EP0730671B1
公开(公告)日：2001-10-17
申请号：EP94922896.9
申请日：1994-07-08
发明人： SENATEUR, Jean-Pierre , MADAR, Roland , WEISS, François , THOMAS, Olivier , ABRUTIS, Adulfas L.M.G.P.ENS de Phys. de Grenoble
CPC分类号： B01D1/18 , C23C16/4486
摘要： A device for feeding precursors of one or more elements to be deposited on a hot substrate into a chemical vapour deposition chamber (1). The device includes at least one container (10) for the liquid or dissolved precursor(s) (11), a system (12) for maintaining a higher pressure in the container than in the chamber, at least one injector combined with each container and provided with a control unit for periodically injecting precursor droplets of a given volume into the deposition chamber, and a system (3) for delivering the vaporised injected materials to a substrate located in the deposition chamber.
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2.发明公开PROCEDE ET DISPOSITIF D'INTRODUCTION DE PRECURSEURS DANS UNE ENCEINTE DE DEPOT CHIMIQUE EN PHASE VAPEUR 失效方法和装置用于馈入VORLÄUFVERBINDUNGENCVD - 反应器
公开(公告)号：EP0730671A1
公开(公告)日：1996-09-11
申请号：EP94922896.0
申请日：1994-07-08
发明人： SENATEUR, Jean-Pierre , MADAR, Roland , WEISS, François , THOMAS, Olivier , ABRUTIS, Adulfas L.M.G.P.ENS de Phys. de Grenoble
CPC分类号： B01D1/18 , C23C16/4486
摘要： A device for feeding precursors of one or more elements to be deposited on a hot substrate into a chemical vapour deposition chamber (1). The device includes at least one container (10) for the liquid or dissolved precursor(s) (11), a system (12) for maintaining a higher pressure in the container than in the chamber, at least one injector combined with each container and provided with a control unit for periodically injecting precursor droplets of a given volume into the deposition chamber, and a system (3) for delivering the vaporised injected materials to a substrate located in the deposition chamber.
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