公开(公告)号：EP1222841B1

公开(公告)日：2004-12-01

申请号：EP00966254.5

申请日：2000-10-02

申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

发明人： GILLON, Pascale

IPC分类号： H05B6/32

CPC分类号： H05B6/32

摘要： The invention concerns a method for melting and solidifying an electric conductor sample, which consists in: melting the sample by induction using a high frequency alternating magnetic field; superposing on the alternating magnetic field a continuous magnetic field gradient with high intensity, so as to levitate the melted sample without contact with solid surfaces; and in reducing the intensity of the alternating magnetic field by increasing the intensity of the continuous magnetic field, so as to maintain the sample in levitation without contact with the solid surfaces; and reducing the temperature of the sample to obtain solidification without contact of said sample. The invention is applicable to samples comprising at least a metastable phase.

公开(公告)号：EP0879087A1

公开(公告)日：1998-11-25

申请号：EP97904500.0

申请日：1997-02-06

申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

发明人： PILLIN, Béatrice ,  GILLON, Pascale ,  BEAUGON, Eric

IPC分类号： B03C1 ,  C22B9 ,  C22B21

CPC分类号： C22B21/066 ,  B03C1/035 ,  B03C1/23 ,  C22B9/023 ,  Y02P10/234

摘要： A method for separating inclusions from an electrically conductive liquid flow using electromagnetic forces, wherein the inclusions and the liquid have differing electrical conductivities, is disclosed. Said flow is exposed to a spatially heterogeneous magnetic flux produced by a continuous static magnetic field.

公开(公告)号：EP2082074A2

公开(公告)日：2009-07-29

申请号：EP07820102.7

申请日：2007-09-10

申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) ,  Universite d'Orleans

发明人： GILLON, Pascale ,  THOMANN, Anne-Lise ,  BRAULT, Pascal

IPC分类号： C23C14/16 ,  C23C14/14 ,  C30B23/02

CPC分类号： C23C14/352 ,  C22C16/00 ,  C23C14/027 ,  C23C14/14 ,  C23C14/548 ,  C30B23/066 ,  C30B29/52

摘要： The present invention relates to a process for depositing a thin film of a metal alloy on a substrate, said film comprising at least four components and said alloy being either: an amorphous alloy containing at least 50 at% of the elements Ti and Zr, or a high-entropy alloy, the elements of which are chosen from the group consisting of Al, Co, Cr, Cu, Fe, Ni, Si, Mn, Mo, V, Zr and Ti; by simultaneous magnetron sputtering of at least two targets. The present invention also relates to a metal alloy in the form of a thin film comprising at least four components, which can be deposited on a substrate by implementing the process.