专利检索 ap:("CORNING INCORPORATED") AND inv:"MURRAY, Gregory, L." 第 1 页

1.

发明公开
A METHOD TO AVOID STRIAE IN EUV LITHOGRAPHY MIRRORS 审中-公开
标题翻译： AVOID纹影对EUV光刻方法镜子

公开(公告)号：EP1324857A1

公开(公告)日：2003-07-09

申请号：EP01979254.8

申请日：2001-09-18

申请人： CORNING INCORPORATED

发明人： DAVIS, Claude, L., Jr. , BEST, Michael, E. , EDWARDS, Mary, J.,CORNING INCORPORATED , HOBBS, Thomas, W.,CORNING INCORPORATED , MURRAY, Gregory, L.

IPC分类号： B24B7/24

CPC分类号： B24B1/00 , B24B13/06 , C03B19/1453 , C03B19/1469 , C03B23/0252

摘要： A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material (41) to produce an EUV mirror blank (43) and polishing a top face of the EUV mirror blank (43) to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material (61); sagging a plate of the glass material over the top face of the piece (63) to produce an EUV mirror blank (66); and polishing a top face of the EUV mirror blank to produce an EUV polished mirror (65).